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Effect of Deposition Parameters on the Microstructure and Growth Rate of CVD Mullite Environmental Barrier Coatings

Published online by Cambridge University Press:  01 February 2011

Soumendra Basu ,
Tushar Kulkarni  and
Vinod Sarin
Soumendra Basu
Affiliation:
basu@bu.edu, Boston University, Manufacturing Engineering, 15 St. Mary's Street, Brookline, MA, 02446, United States, 617-353-6728, 617-353-5548
Tushar Kulkarni
Affiliation:
tushark@bu.edu
Vinod Sarin
Affiliation:
sarin@bu.edu
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Abstract

Si-based ceramics such as SiC require environmental barrier coatings to protect against hot-corrosion and recession in gas turbine applications. Dense, crystalline mullite coatings of uniform thickness have been deposited by hot-wall chemical vapor deposition (CVD) on SiC substrates, using the AlCl3-SiCl4-CO2-H2 system. The effects of the CVD deposition parameters such as temperature, total reactor pressure, and metal-chloride partial pressure on the coating microstructure and growth kinetics have been investigated, and are discussed in this paper.

Keywords

coatingchemical vapor deposition (CVD) (deposition)environmentally protective
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 890: Symposium Y – Surface Engineering for Manufacturing Applications , 2005 , 0890-Y01-06
Copyright
Copyright © Materials Research Society 2006

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References

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