The minimum temperature for the crystallization of amorphous TiNi on substrates is of interest in developing thin-film SME material while minimizing chemical interactions with the substrate. Using 20 micron thick free standing TiNi material annealed in a vacuum furnace, X-Ray diffraction of the thin-films indicated that the crystallization occured within 20 minutes at 510°C, 490°C and 480°C. At 450°C, crystallization kinetics were significantly slower, and the foils were fulling crystallized after annealing for 7.5 hrs. To further lower the crystallization temperature, cold working of the foil by rolling was introduced and full crystallization was observed after 7.5 hours annealing at 400°C in a cold-worked foil. Cold working and annealing at 400°C and 350°C for 7.5 hrs did not observably promote lower crystallization temperatures.