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Dry Etching to form Submicron Features in CMR Oxides: (Pr,Ba,Ca)MnO3 and (La,Sr)MnO3

  • K. P. Lee (a1), K. B. Jung (a1), H. Cho (a1), D. Kumar (a1), S. V. Pietambaram (a1), R. K. Singh (a1), P. H. Hogan (a2), K. H. Dahmen (a2), Y. B. Hahn (a1) and S. J. Pearton (a1)...

Abstract

Effective pattern transfer into (Pr,Ba,Ca)MnO3 and (La,Sr)MnO3 has been achieved using Cl2/Ar discharges operated under Inductively Coupled Plasma conditions. Etch rates up to 900 Å-min−1 for (La,Sr)MnO3 and 300 Å-min−1 for (Pr,Ba,Ca)MnO3 were obtained, with these rates being a strong function of ion flux, ion energy and ion-to-neutral ratio. The etching is still physically-dominated under all conditions, leading to significant surface smoothing on initially rough samples. Sub-micron (0.35 μm) features have been produced in both materials using SiNx as the mask.

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Dry Etching to form Submicron Features in CMR Oxides: (Pr,Ba,Ca)MnO3 and (La,Sr)MnO3

  • K. P. Lee (a1), K. B. Jung (a1), H. Cho (a1), D. Kumar (a1), S. V. Pietambaram (a1), R. K. Singh (a1), P. H. Hogan (a2), K. H. Dahmen (a2), Y. B. Hahn (a1) and S. J. Pearton (a1)...

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