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Doping Efficiency of N-Type a-Si:H Doped with a Liquid Organic Source

Published online by Cambridge University Press:  01 January 1993

K. Gaughan
Affiliation:
Department of Physics, University of Utah, Salt Lake City, UT 84112
ZHAOHUI Lin
Affiliation:
Department of Physics, University of Utah, Salt Lake City, UT 84112
J.M. Viner
Affiliation:
Department of Physics, University of Utah, Salt Lake City, UT 84112
P.C. Taylor
Affiliation:
Department of Physics, University of Utah, Salt Lake City, UT 84112
P.C. Mathur
Affiliation:
Department of Physics, University of Delhi, New Delhi, 110007, India
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Abstract

N-type amorphous silicon films were grown using a mixture of silane and tertiarybutylphosphine (TBP-C4H11P) vapor in a plasma enhanced chemical vapor deposition system. The concentration of TBP in silane was varied from 0 to 3% by volume. As expected, at low doping levels, the photoluminescence (PL) intensity associated with both the band-tail recombination (peak at 1.3 eV) and deep-defect recombination (peak at 0.8 eV) decreased as the impurity concentration increased, but for TBP concentrations > 0.1% the PL intensity increased again. For moderate doping levels the activation energy for conductivity leveled off at ∼ 0.2 eV. For concentrations of TBP > 0.1% the activation energy for dark conductivity increased. A shift in the optical gap was observed for the highest impurity concentrations due to the incorporation of carbon from the TBP. These results are interpreted as a pronounced decrease in the doping efficiency for heavily doped films (> 0.1%) perhaps influenced by the increased carbon concentration.

Type
Research Article
Copyright
Copyright © Materials Research Society 1993

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References

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