Permalloy magnetic structures were fabricated using electron beam lithography and then deposited by evaporation followed by lift-off. The structures were studied for their magnetic domain properties with respect to their aspect ratio. Instead of conventional switching using a magnetic field, a current carrying conductor was used to switch the structures. The current value was gradually increased and magnetic force microscopy was used to study the domain changes of the remanent structures after every increment. At the same time, simulation is done using object-oriented micro-magnetic framework to compare with the experimental results.