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Discrete Steps in the Capacitance-Voltage Characteristics of GaInN/GaN Light Emitting Diode Structures

  • Y. Xia (a1) (a2), E. Williams (a1) (a2), Y. Park (a2) (a3), I. Yilmaz (a1) (a2), J.M. Shah (a2) (a3), E.F. Schubert (a1) (a2) (a3) and C. Wetzel (a1) (a2)...

Abstract

A detailed modeling of the electronic bandstructure of GaInN alloys and GaInN/GaN heterostructures typically used for high efficiency light emitting diodes is of high relevance for future improvements. Here we are exploring opportunities to accurately quantify the carrier dynamics under forward and reverse voltage bias. In GaInN/GaN LED-type heterostructures we observe distinct steps in the junction capacitance as a function of bias voltage within the depletion regime. Up to three individual steps can be identified that correspond to alternating ranges of capacitive and resistive impedances. Our analysis suggests that we are quantitatively monitoring the electron concentration in each individual quantum well. The pronounced clarity of the data reveals a high level of epitaxial perfection and spatial homogeneity across the entire area of the junction.

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Discrete Steps in the Capacitance-Voltage Characteristics of GaInN/GaN Light Emitting Diode Structures

  • Y. Xia (a1) (a2), E. Williams (a1) (a2), Y. Park (a2) (a3), I. Yilmaz (a1) (a2), J.M. Shah (a2) (a3), E.F. Schubert (a1) (a2) (a3) and C. Wetzel (a1) (a2)...

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