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Directed self-assembly lithography for half-pitch sub-15 nm pattern fabrication process

  • Hironobu Sato (a1), Yuriko Seino (a1), Naoko Kihara (a1), Yusuke Kasahara (a1), Katsutoshi Kobayashi (a1), Katsuyoshi Kodera (a1), Hideki Kanai (a1), Yoshiaki Kawamonzen (a1), Shinya Minegishi (a1), Ken Miyagi (a1), Toshikatsu Tobana (a1), Noriyuki Hirayanagi (a1), Tomoharu Fujiwara (a1), Tsukasa Azuma (a1) and Teruaki Hayakawa (a2)...

Abstract

This paper introduces a fabrication method to achieve sub-15 nm line-and-space (L/S) patterns by combining grapho- and chemo-epitaxy using poly(styrene-block-methyl methacrylate) copolymer (PS-b-PMMA). The fabrication method is simple, since it eliminates photoresist stripping and also does not require any special materials to form pinning patterns. In this process, the ridges formed on spin-on-glass (SOG) surface work as physical guides and the photoresists on them are utilized as a pinning layer. Fine PS-b-PMMA L/S patterns were obtained in sufficient critical dimension (CD) range of the guide patterns that corresponded to the 15% dose margin using ArF immersion lithography. 3-dimensional grid defects were found to be the origin of the short defects. The half-pitch (hp) 15 nm L/S patterns were transferred successfully to SOG/spin-on-carbon (SOC) stacked substrate.

We also describe fabrication of sub-10 nm L/S patterns using a high-chi block copolymer (BCP).

Copyright

Corresponding author

*Corresponding author: hironobu.sato@eidec.co.jp

References

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1. Kato, H., et al. ., Microelectronic Engineering 110, pp.152155 (2013).
2. Seino, Y., et al. ., , Journal of Micro/Nanolithography, MEMS, and MOEMS Vol. 12 Issue 3, 031305 (2013).
3. Liu, C., et al. , Proc. SPIE 9049, Alternative Lithographic Technologies VI, 904909 (2014).
4. Gronheid, R., et al. ., Proc. SPIE9049–4 (2014).
5. Kim, J., et al. ., J. Photopolymer Sci. and Tech. Vol. 26(5), pp573579 (2013).
6. Seino, Y., et al. ., The 40th International Conference on Micro and Nano Engineering (MNE 2014), Lausanne, Switzerland, 8076 (2014).
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8. Kihara, N., et al. ., submitted.
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Keywords

Directed self-assembly lithography for half-pitch sub-15 nm pattern fabrication process

  • Hironobu Sato (a1), Yuriko Seino (a1), Naoko Kihara (a1), Yusuke Kasahara (a1), Katsutoshi Kobayashi (a1), Katsuyoshi Kodera (a1), Hideki Kanai (a1), Yoshiaki Kawamonzen (a1), Shinya Minegishi (a1), Ken Miyagi (a1), Toshikatsu Tobana (a1), Noriyuki Hirayanagi (a1), Tomoharu Fujiwara (a1), Tsukasa Azuma (a1) and Teruaki Hayakawa (a2)...

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