Hostname: page-component-848d4c4894-sjtt6 Total loading time: 0 Render date: 2024-06-27T03:09:05.169Z Has data issue: false hasContentIssue false
  • English
  • Français

Direct Patterning of Quartz Substrates by Laser Ablation Using VUV Anti-Stokes Raman Pulses

Published online by Cambridge University Press:  01 January 1992

K. Sugioka ,
S. Wada ,
H. Tashiro ,
K. Toyoda ,
T. Sakai ,
H. Takai ,
H. Moriwaki  and
A. Nakamura
K. Sugioka
Affiliation:
RIKEN, The Institute of Physicaland Chemical Research, Wako, Saitama 351–01, Japan
S. Wada
Affiliation:
RIKEN, The Institute of Physicaland Chemical Research, Wako, Saitama 351–01, Japan
H. Tashiro
Affiliation:
RIKEN, The Institute of Physicaland Chemical Research, Wako, Saitama 351–01, Japan
K. Toyoda
Affiliation:
RIKEN, The Institute of Physicaland Chemical Research, Wako, Saitama 351–01, Japan
T. Sakai
Affiliation:
Tokyo Denki University, 2–2, Kanda-Nishi-Cho, Chiyoda-Ku, Tokyo 101, Japan
H. Takai
Affiliation:
Tokyo Denki University, 2–2, Kanda-Nishi-Cho, Chiyoda-Ku, Tokyo 101, Japan
H. Moriwaki
Affiliation:
Science University of Tokyo, 1–3, Kagurazaka, Shinjuku-Ku, Tokyo 162, Japan
A. Nakamura
Affiliation:
Science University of Tokyo, 1–3, Kagurazaka, Shinjuku-Ku, Tokyo 162, Japan
Get access

Abstract

High speed microfabrication of quartz substrates by laser ablation using vacuum ultraviolet (VUV) laser beams is described. The VUV light is generated by anti-Stokes stimulated Raman scattering of fourth harmonics of Q-switched Nd:YAG laser. The well-defined patterns with a cross-sectional profile of rectangular shape are formed by using a contact mask. The role of short wavelength components of the VUV laser beams in the process is discussed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 285: Symposium I – Laser Ablation in Materials Processing–Fundamentals and Applications , 1992 , 225
Copyright
Copyright © Materials Research Society 1993

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Kawamura, Y., Toyoda, K., and Namba, S., Appl. Phys. Lett. 40, 374 (1982).Google Scholar
2. Srinivasan, R. and Mayne-Banton, V., Appl. Phys. Lett., 41, 576 (1982).Google Scholar
3. Brannon, J. H., Lankard, J. R., Baise, A. I., Burns, F., and Kaufmann, J., J. Appl. Phys. 58, 2063 (1985).Google Scholar
4. Wada, S., Kasai, A., and Tashiro, H., Optics Lett. 17, 97 (1992).Google Scholar
5. Ihlemann, J., Wolff, B., and Simon, P., Appl. Phys. A54, 363 (1992).Google Scholar
6. Yokoyama, S., Yamakage, Y., and Hirose, M., Appl. Phys. Lett. 47, 389 (1985).Google Scholar