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Differences Between the Growth Kinetics of Thin Film and Bulk Diffusion Couples*

Published online by Cambridge University Press:  15 February 2011

U. Gösele
Affiliation:
IBM T. J. Watson Research Center, Yorktown Heights, NY10598 (U.S.A.)
K. N. Tu
Affiliation:
IBM T. J. Watson Research Center, Yorktown Heights, NY10598 (U.S.A.)
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Abstract

It is proposed that interface reaction barriers in binary A/B diffusion couples lead to the absence of phases predicted by the equilibrium phase diagram, provided that the diffusion zones are sufficiently thin (“thin film case”). With increasing thickness of the diffusion zones the influence of interface reaction barriers decreases and the simultaneous existence of diffusion-controlled growth of all equilibrium phases is expected (“bulk case”). First-phase and different modes of second-phase formation in the diffusion zones as well as the influence of impurities are discussed with specific reference to silicide formation. For this discussion the concept of a critical thickness of the first forming phase is introduced, below which a second compound phase cannot grow simultaneously with the first one.

Type
Research Article
Copyright
Copyright © Materials Research Society 1982

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Footnotes

*

Abstract of a paper presented at the Symposium on Thin Films and Interfaces, Boston, MA, U.S.A., November 16–19, 1981.

References

* Abstract of a paper presented at the Symposium on Thin Films and Interfaces, Boston, MA, U.S.A., November 16–19, 1981.