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Diamond Nanopit Arrays Fabricated by Room-Temperature Nanoimprinting using Diamond Molds

  • Shuji Kiyohara (a1), Masaya Kumagai (a1), Yoshio Taguchi (a2), Yoshinari Sugiyama (a2), Yukiko Omata (a2), Yuichi Kurashima (a3) and Hirofumi Takikawa (a4)...

Abstract

We have investigated the nanopatterning of chemical vapor deposited (CVD) diamond films in room-temperature nanoimprint lithography (RT-NIL), using a diamond nanodot mold. We have proposed the use of polysiloxane as an electron beam (EB) mask and RT-imprint resist materials. The diamond molds of cylinder dot using the RT-NIL process were fabricated with polysiloxane oxide mask in EB lithography technology. The dot in minimum diameter is 500 nm. The pitch between the dots is 2 μm, and dot has a height of about 600 nm. It was found that the optimum imprinting conditions for the RT-NIL : time from spin-coating to imprinting t 1 of 1 min , pressure time t 2 of 5 min, imprinting pressure P of 0.5 MPa. The imprint depth obtained after the press under their conditions was 500 nm. We carried out the RT-NIL process for the fabrication of diamond nanopit arrays, using the diamond nanodot molds that we developed. The resulting diamond nanopit arrays with 500 nm-diameter and 200 nm-depth after the electron cyclotron resonance (ECR) oxygen ion beam etching were fabricated. The diameter of diamond nanopit arrays was in good agreement with that of the diamond nanodot mold.

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1. Spear, K. E., J. Am. Ceram. Soc. 72, 171 (1989).
2. Ueda, K., Kasu, M., Yamauchi, Y., Makimoto, T., Schwitters, M., Twitchen, D. J., Scarsbrook, G. A. and Coe, S. E., IEEE Electron Device Lett. 27, 570 (2006).10.1109/LED.2006.876325
3. Nishibayashi, Y., Ando, H., Furuta, H., Kobayashi, K., Meguro, K., Imai, T., Hirao, T. and Oura, K., New Diamond and Frontier Carbon Technol. 13, 19 (2003).
4. Chan, S. S.M., Raybould, F., Arthur, G., Goodall, F., Jackman, R. B., Diamond Relat. Mater. 5, 317 (1996).
5. Lee, C. H., Jeong, G. H., Park, J. K., Jang, J. H., Kim, T. Y., Suh, S. J., Microelectron. Eng. 87, 2085 (2010).
6. Kiyohara, S., Fujiwara, M., Matsubayashi, F. and Mori, K., J. Mater. Sci. : Mater. Electron. 17, 199 (2006).
7. Kurihara, K., Iwadate, K., Namatsu, H., Nagase, M., Murase, K., J. Vac. Sci. Technol. B13, 2170 (1995).10.1116/1.588098
8. Kiyohara, S., Motoishi, T. and Mori, K., J. Mater. Sci. : Mater. Electron. 15, 99 (2004).
9. Chou, S. Y., Krauss, P.R. and Renstrom, P. J., Appl. Phys. Lett. 67, 3114 (1995).10.1063/1.114851
10. Scheer, H. C., Schulz, H., Hoffmann, T. and Torres, C. M. S., J. Vac. Sci. Technol. B16, 3917 (1998).10.1116/1.590436
11. Kiyohara, S., Kashiwagi, T., Takikawa, H., Kurashima, Y., Taguchi, Y. and Sugiyama, Y., e-J. Surface Sci. and Nanotech. 7, 772 (2009).

Keywords

Diamond Nanopit Arrays Fabricated by Room-Temperature Nanoimprinting using Diamond Molds

  • Shuji Kiyohara (a1), Masaya Kumagai (a1), Yoshio Taguchi (a2), Yoshinari Sugiyama (a2), Yukiko Omata (a2), Yuichi Kurashima (a3) and Hirofumi Takikawa (a4)...

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