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Development of Crystallographic Texture in RF Sputter Deposited CoCrTa/Cr Thin Films

Published online by Cambridge University Press:  03 September 2012

Y. C. Feng ,
D. E. Laughlin  and
D. N. Lambeth
Y. C. Feng
Affiliation:
Department of Materials Science and Engineering, Data Storage System Center, Carnegie Mellon University, Pittsburgh, PA 15213
D. E. Laughlin
Affiliation:
Department of Materials Science and Engineering, Data Storage System Center, Carnegie Mellon University, Pittsburgh, PA 15213
D. N. Lambeth
Affiliation:
Department of Electrical and Computer Engineering, Data Storage System Center, Carnegie Mellon University, Pittsburgh, PA 15213
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Abstract

It is well known that Cr sputtered on glass or NiP/Al substrates has either the (002) or (110) crystallographic texture (depending on the substrate temperature) and that the Co-alloy layers which are deposited on the Cr underlayers have either the (1120) or (1011) textures respectively. However, the dependence of the crystallographic textures on other sputtering parameters is not clear. We report here on the study of the dependence of crystallographic textures of CoCrTa/Cr films on substrate bias. It is found that both Cr (110) and Cr (002) textures can form at elevated temperature, depending on the substrate bias. The development of the crystallographic texture is discussed with a Model. It is also found that the epitaxy of CoCrTa layer depends on the sputtering conditions of both the Cr and the CoCrTa layers. The extrinsic magnetic properties (such as He, S and S*) of thin films with various textures are also presented. By controlling the sputtering procedure, the effects of crystallographic textures on magnetic properties were separated from the effects of film Morphology.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 313: Symposium Q1 – Magnetic Ultrathin Films, Multilayers and Surfaces/Magnetic Interfaces-Physics and Characterizations , 1993 , 357
Copyright
Copyright © Materials Research Society 1993

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References

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