Block copolymers that self-organize are of interest as templates for patterned media, as they potentially provide a low cost fabrication route. Poly(styrene)-Poly(methylmethacrylate) block co-polymers (PS-b-PMMA) of appropriate block length and PS to PMMA ratio self-assemble into a 2-D hexagonal phase in which the PS majority phase is continuous and surrounds cylinders of the minority, PMMA phase. For application of this phase to patterned media it is necessary that the cylinders of the minority phase be oriented perpendicular to the substrate surface. This can be achieved by a number of methods, including appropriate choice of substrate and use of a random co-polymer underlayer. Appropriate substrates include H-terminated silicon, some carbon coatings and some ITO glasses. Use of an acetic acid wash causes the minority PMMA component can be induced to be rearranged, giving rise to pores perpendicular to the substrate. Electrodeposition of a metal into the pores produces a hardmask which can be used with ion-milling to transfer the block co-polymer pattern onto a magnetic thin film.