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Determination of a-Si:H Film Quality Throughfst and Sclc Techniques

  • R. Martins (a1), M. Vieira (a1), E. Fortunato (a1), I. Ferreira (a1), F. Soares (a1) and L. GuimarĀes (a1)...

Abstract

The ambipolar diffusion length (L*) and the effective lifetime (τ*) in undoped a-Si:H films have been measured by the Flying Spot Technique (FST). This technique consists in measuring the decay range of charges in Schottky barriers and the potential induced by a laser beam with a constant motion rate. The data show that the FST measurements are quite suitable to determine separately the effective diffusion length and the effective lifetime of the carriers, taking into account the surface effect. The results also indicate that the photosensitivity is not the best parameter to characterize film quality. Indeed, films with high photosensitivity can present a poor lifetime and diffusion length that make them unsuitable to be used in optoelectronic devices. The results obtained by FST have been correlated with the Density of States (DOS) inferred by the Space Charge Limited Current (SCLC) measurements performed in the temperature range of 300–430 K and by the Constant Photocurrent Method (CPM) in forward biased Schottky diodes at room temperature. The dependence of the DOS on temperature shows that the SCLC technique is clearly influenced by the thermally activated carriers.

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van den Heuvel, J., PhD thesis, Delft University of Technology, the Netherlands (1989).
2. den Boer, W., PhD thesis, Delft University of Technology, the Netherlands (1983).
3. Vanecek, M., Kocka, J., Stuchik, J., Stika, O and Trisk, A., Solid State Comm., 39 (1981).
4. Ferreira, I., internal report on CPM and Characterization of a-SiGe:H alloys, Delft University of Technology, the Netherlands (1990).
5. Gradshteyn, I. and Ryzhik, I., Table of integrals ed. (Acad. Press, New York, 1980).
6. Martins, R., Guimarães, L., Fortunato, E., Vieira, M., Carvalho, N., Santos, M. and Ferreira, I., Proc. of 8th Conf., Vols. I and II, ed. Solomon, I., Equer, B. and Helm, P., 653 (1989).
7. Fortunato, E., to be published (1990).
8. Nijs, J. et al., to be published (1990).

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Determination of a-Si:H Film Quality Throughfst and Sclc Techniques

  • R. Martins (a1), M. Vieira (a1), E. Fortunato (a1), I. Ferreira (a1), F. Soares (a1) and L. GuimarĀes (a1)...

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