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Detection of Titanium Silicide Formation and Phase Transformation by Picosecond Ultrasonics

Published online by Cambridge University Press:  25 February 2011

H. -N. Lin ,
R. J. Stoner ,
H. J. Maris ,
J. M. E. Harper ,
C. Cabral Jr ,
J. -M. Halbout  and
G. W. Rubloff
H. -N. Lin
Affiliation:
Department of Physics, Brown University, Providence, RI 02912
R. J. Stoner
Affiliation:
Department of Physics, Brown University, Providence, RI 02912
H. J. Maris
Affiliation:
Department of Physics, Brown University, Providence, RI 02912
J. M. E. Harper
Affiliation:
IBM T. J. Watson Research Center, Yorktown Heights, NY 10598
C. Cabral Jr
Affiliation:
IBM T. J. Watson Research Center, Yorktown Heights, NY 10598
J. -M. Halbout
Affiliation:
IBM T. J. Watson Research Center, Yorktown Heights, NY 10598
G. W. Rubloff
Affiliation:
IBM T. J. Watson Research Center, Yorktown Heights, NY 10598
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Abstract

Picosecond ultrasonics is employed to study the titanium silicide formation sequence for evaporated Ti films on silicon substrates annealed at temperatures between 300 and 800 °C. The measurements show significant differences in the ultrasonic echo pattern before and after the structural phases C49 and C54 are formed, thus indicating that picosecond ultrasonics is a sensitive non-destructive probe of silicide formation. The longitudinal sound velocity has been found to be (8.3 ± 0.2) × 105 cm/sec for C49 TiSi2, and about 5% lower for the C54 phase.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 260: Symposium C – Advanced Metallization and Processing for Semiconductor Devices and Circuits , 1992 , 221
Copyright
Copyright © Materials Research Society 1992

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References

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