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Deposition of Adherent Diamond Coatings on WC-Co Substrates

Published online by Cambridge University Press:  01 February 2011

Zhenqing Xu ,
Leonid Lev ,
Michael Lukitsch  and
Ashok Kumar
Zhenqing Xu
Affiliation:
zxu3@eng.usf.edu, University of South Florida, Department of Mechanical Engineering, ENB 118, 4202 E. Fowler Ave., Tampa, FL, 33620, United States, 813-396-9351
Leonid Lev
Affiliation:
leo.lev@gm.com, General Motors Coroporation, United States
Michael Lukitsch
Affiliation:
michael.lukitsch@gm.com, General Motors Coroporation, United States
Ashok Kumar
Affiliation:
akumar@eng.usf.edu, University of South Florida, Department of Mechanical Engineering, United States
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Abstract

High quality well-adhered microcrystalline diamond coatings have been produced by the microwave plasma enhanced chemical vapor deposition (MPECVD) technique on cemented carbide substrates. A multi-interlayer system Cr/CrN/Cr was deposited on the WC-Co substrate before diamond deposition to work as a diffusion barrier. The coated substrate was peened with friable diamond powder to roughen the surface resulting in high nucleation density. Adherent diamond film has been successfully deposited on the substrate at temperature around 700°C with 1.0 % CH4 in Hydrogen plasma. The surface morphology and film structure has been studied by Scanning Electron Microscopy (SEM) and X-Ray diffraction technique. The adhesion of the diamond film has been evaluated by Rockwell indentation tests.

Keywords

diamondplasma-enhanced CVD (PECVD) (deposition)coating
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 890: Symposium Y – Surface Engineering for Manufacturing Applications , 2005 , 0890-Y01-02
Copyright
Copyright © Materials Research Society 2006

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