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Deposition and Annealing Studies of Diamond-Like Carbon Grown by Molecular Beam Deposition

Published online by Cambridge University Press:  10 February 2011

Oliver Goetzberger
Affiliation:
Toyota Technological Institute, 2-12-1 Hisakata, Tempaku, Nagoya 468-8511 Japan, Phone/Fax: +81-52-809-1877 e-mail: oliver@toyota-ti.ac.jp
Nobuaki Kojima
Affiliation:
Toyota Technological Institute, 2-12-1 Hisakata, Tempaku, Nagoya 468-8511 Japan, Phone/Fax: +81-52-809-1877 e-mail: oliver@toyota-ti.ac.jp
Aurangzeb Khan
Affiliation:
Toyota Technological Institute, 2-12-1 Hisakata, Tempaku, Nagoya 468-8511 Japan, Phone/Fax: +81-52-809-1877 e-mail: oliver@toyota-ti.ac.jp
Masafumi Yamaguchi
Affiliation:
Toyota Technological Institute, 2-12-1 Hisakata, Tempaku, Nagoya 468-8511 Japan, Phone/Fax: +81-52-809-1877 e-mail: oliver@toyota-ti.ac.jp
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Abstract

Studies on the electrical conductivity of molecular beam deposited carbon films after annealing of the carbon films have been carried out. Detailed temperature dependence of conductivity on the as-deposited and on annealed samples has been investigated. The results were interpreted in terms of a model which includes a variable range hopping and strongly scattering metallic components. A correlation between annealing behavior of the electrical conductivity and the results of x-ray photoelectron spectroscopy and Raman spectroscopy is presented.

Type
Research Article
Copyright
Copyright © Materials Research Society 2000

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References

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