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Dependence of Mo/Si Multilayer Morphology on Deposition Angle

  • Yuanda Cheng (a1), Mary Beth Stearns (a1) and David J. Smith

Abstract

Studies have been made of the dependence of the structure on the deposition angle and the substrate temperature of a series of Mo/Si multilyers fabricated in a UHV system by e-beam evaporation. The detailed morphology was determined by cross-sectional high resolution electron microscopy. Columnar growth in the crystalline Mo layers was found to follow the tangent rule. The overall quality of the multilayers was found to depend strongly on the growth conditions.

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Also at: Center for Solid State Science.

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Dependence of Mo/Si Multilayer Morphology on Deposition Angle

  • Yuanda Cheng (a1), Mary Beth Stearns (a1) and David J. Smith

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