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Defects in Mg-Doped InP and GaInAs Grown by Omvpe

Published online by Cambridge University Press:  25 February 2011

Fred R. Bacher
Affiliation:
Oregon Graduate Center, Department of Applied Physics and Electrical Engineering, 19600 N.W. Von Neumann Drive, Beaverton, Oregon 97006-1999, USA
H. Cholan
Affiliation:
Oregon Graduate Center, Department of Applied Physics and Electrical Engineering, 19600 N.W. Von Neumann Drive, Beaverton, Oregon 97006-1999, USA
Wallace B. Leigh
Affiliation:
Oregon Graduate Center, Department of Applied Physics and Electrical Engineering, 19600 N.W. Von Neumann Drive, Beaverton, Oregon 97006-1999, USA
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Abstract

We report on the defects present in doped InP and GaInAs grown by organometallic vapor phase epitaxy (OMVPE). The material was grown in an atmospheric pressure system using group III trimethyl sources, arsine and phosphine. Bis(cyclopentadienyl) magnesium (Cp2Mg) was present as a p-type source of magnesium. Defects in as-grown material were characterized using photoluminescence (PL), Hall-effect, and deep level transient spectroscopy (DLTS). Various levels of Mg doping were investigated, ranging from 5 × 1015 to 1 × 1019 cm−3. Radiative defects were observed at 77 K corresponding to PL emission from conduction band/shallow donor to acceptor levels including emission at 1.37 eV identified as the shallow hydrogenic acceptor, and emission lines at 1.3 eV and 1.0 eV in heavily doped material. Corresponding hole traps in InP:Mg were observed by DLTS having thermal activation energies of 0.20 and 0.40 eV, the 0.40 eV trap being the dominant defect in p-type InP. In GaInAs grown near lattice-matched to InP, radiative emission is also observed from deep centers 100 meV from band edge emission. This emission is observed to be related to lattice-mismatch of the ternary with the InP, and is found to be accentuated and broadened in GaInAs doped with Mg.

Type
Research Article
Copyright
Copyright © Materials Research Society 1987

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References

REFERENCES

Olsen, G. H., J. Cryst. Growth 31, 233 (1975)CrossRefGoogle Scholar
[2] Lang, D. V., J. Appl. Phys. 45, 3014 (1974)Google Scholar
[3] Bachman, K. J., Buehler, E., Miller, B. I., McFee, J. H. and Thiel, F. A., J. Cryst. Growth 39, 137 (1977)Google Scholar
[4] Roder, O., Heim, U., and Pilkuhn, M. H., J. Phys. Chem. Solids 31, 2625 (1970)Google Scholar
[5] Joyce, B. D. and Williams, E. W., Inst. Phys. Conf. Ser. 9, 57 (1971)Google Scholar
[6] Nelson, A. W., and Westbrook, L. D., J. Cryst. Growth 68, 102 (1984)CrossRefGoogle Scholar
[7] Pelloie, J. L., Guillot, G., Nouailhat, A. and Antolini, A. G., J. Appl. Phys. 59, 1536 (1981)Google Scholar
[8] Inuishi, M. and Vessels, B. W., Electron. Lett. 17, 685 (1981)Google Scholar
[9] Yagi, T., Fujiwara, Y., Nishino, T. and Hamakawa, Y., Jap. J. Appl. Phys. 22, L467 (1983)Google Scholar
[10] Goetz, K. H., Bimberg, D., Brauchle, K. A., Jurgensen, H., and Selders, J., Razeghi, M., Kuphai, E., Appl. Phys. Lett. 46, 277 (1985)Google Scholar