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Defect Structures and Planar Faults in Plasma Spray Deposited MoSi2

Published online by Cambridge University Press:  01 January 1992

Bimal K. Kad
Affiliation:
Dept. of Applied Mechanics and Engineering Sciences, MC-0411University of California-SanDiego, LaJolla, CA 92093-0411
Kenneth S. Vecchio
Affiliation:
Dept. of Applied Mechanics and Engineering Sciences, MC-0411University of California-SanDiego, LaJolla, CA 92093-0411
Robert J. Asaro
Affiliation:
Dept. of Applied Mechanics and Engineering Sciences, MC-0411University of California-SanDiego, LaJolla, CA 92093-0411
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Abstract

Plasma-sprayed microstructures of MoSi2 have been studied by electron microscopy. The as-deposited microstructures are metastable and inhomogenous. Two new dissociations of [001] and 1/2[331] dislocations have been observed for the first time. The 1/2[331] is dissociated on the (lTO) plane bounding a superlattice intrinsic stacking fault (SISF). The reaction is given as: 1/2[331] = 1/4[331] + SISF + [331]. The [001] is also dissociated on (110) plane into two symmetrical components, with the reaction being given as [001] = 1/2[001] + 1/2[001].

Type
Research Article
Copyright
Copyright © Materials Research Society 1995

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References

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