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CVD of Silicon Carbide on Structural Fibers: Microstructure and Composition

Published online by Cambridge University Press:  15 February 2011

Lisa C. Veitch
Affiliation:
NASA Lewis Research Center, Cleveland, OH
Francis M. Terepka
Affiliation:
NASA Lewis Research Center, Cleveland, OH
Suleyman A. Gokoglu
Affiliation:
NASA Lewis Research Center, Cleveland, OH
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Abstract

Structural fibers are currently being considered as reinforcements for intermetallic and ceramic materials. Some of these fibers, however, are easily degraded in a high temperature oxidative environment. Therefore, coatings are needed to protect the fibers from environmental attack.

Silicon carbide (SiC) was chemically vapor deposited (CVD) on Textron's SCS6 fibers. Fiber temperatures ranging from 1350 to 1500 °C were studied. Silane (SiH4) and propane (C3H8.) were used for the source gases and different concentrations of these source gases were studied. Deposition rates were determined for each group of fibers at different temperatures. Less variation in deposition rates were observed for the dilute source gas experiments than the concentrated source gas experiments. A careful analysis was performed on the stoichiometry of the CVD SiC-coating using electron microprobe. Microstructures for the different conditions were compared. At 1350°C, the microstructures were similar;however, at higher temperatures, the microstructure for the more concentrated source gas group were porous and columnar in comparison to the cross sections taken from the same area for the dilute source gas group.

Type
Research Article
Copyright
Copyright © Materials Research Society 1992

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References

1. Choi, B.J. and Kim, D.R., J. Mater. Sc. Let. 10 860 (1991).Google Scholar
2. Saigal, A. and Das, N., Adv. Cer. Mater. 3 (6), 580583 (1988).Google Scholar
3. Nilhara, K., Suda, A., and T. Harai (Proc. of Int'l. Symp. on Cer. Comp. for Engines, Japan, 1983) pp.480489.Google Scholar
4. Gokoglu, S.A., Kuczmarski, M., Veitch, L.C., Tsui, P. and Chait, A., in Chemical Vapor Deposition, edited by Spear, K.E. and Cullen, G.W. (The Electrochem. Soc. Proc. 11 Pennington 1990) pp. 3137.Google Scholar