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Crystallization of Germanium-Carbon Alloys - Structure and Electronic Transport

  • T.-M. John (a1), J. Bläsing (a1), P. Veit (a1) and T. Drüsedau (a1)

Abstract

Amorphous Ge1-xCx alloys were deposited by rf-magnetron sputtering from a germanium target in methane-argon atmosphere. Structural investigations were performed by means of wide and small angle X-ray scattering, X-ray reflectometry and cross-sectional transmission electron microscopy. The electronic transport properties were characterized using Hall-measurements and temperature depended conductivity. The results of X-ray techniques together with the electron microscopy clearly proof the existence of a segregation of the components and cluster formation already during deposition. The temperature dependence of the electronic conductivity in the as-prepared films follows the Mott' T−1/4 law, indicating transport by a hopping process. After annealing at 870 K, samples with x≤0.4 show crystallization of the Ge-clusters with a crystallite size being a function of x. After Ge-crystallization, the conductivity increases by 4 to 5 orders of magnitude. Above room temperature, electronic transport is determined by a thermally activated process. For lower temperatures, the σ(T) curves show a behaviour which is determined by the crystallite size and the free carrier concentration, both depending on the carbon content.

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References

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Crystallization of Germanium-Carbon Alloys - Structure and Electronic Transport

  • T.-M. John (a1), J. Bläsing (a1), P. Veit (a1) and T. Drüsedau (a1)

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