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Crystallization behavior of Ge1Cu2Te3 amorphous film

  • Yuji Sutou (a1), Toshiya Kamada (a2), Yuta Saito (a3), Masashi Sumiya (a4) and Junichi Koike (a5)...

Abstract

The electrical resistance on the crystallization process of sputtered-deposited Ge1Cu2Te3 film was investigated by two-point probe method. It was found that the amorphous Ge1Cu2Te3 film crystallizes into a single Ge1Cu2Te3 phase with a chalcopyrite structure, which leads to a large resistance drop. The crystallization temperature of the Ge1Cu2Te3 amorphous film was about 250 °C, which is about 70 °C higher than the conventional Ge2Sb2Te5 amorphous film. The activation energy for the crystallization of the Ge1Cu2Te3 amorphous film was higher than that of the Ge2Sb2Te5 amorphous film. The Ge1Cu2Te3 compound with a low melting point can be expected to be suitable as the phase change material for PCRAM.

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Keywords

Crystallization behavior of Ge1Cu2Te3 amorphous film

  • Yuji Sutou (a1), Toshiya Kamada (a2), Yuta Saito (a3), Masashi Sumiya (a4) and Junichi Koike (a5)...

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