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Correlation Between Defect Density and Process Variables In Step-Graded, Relaxed Si0.7Ge0.3 Grown on Si by Rtcvd

  • G. Patrick Watson (a1), Eugene A. Fitzgerald (a1), Bahram Jalali (a1), Ya-Hong Xie (a1), Bonnie Weir (a1) and Leonard C. Feldman (a1)...

Abstract

The effect of the average grading rate and of the number of incremental Ge alloy steps on the threading dislocation density has been studied in 30% Ge relaxed films formed by rapid thermal chemical vapor deposition (RTCVD) on Si substrates. Electron beam induced current (EBIC) images and transmission electron microscopy (TEM) show that threading defects fall in two categories: individual threading dislocations (dark spot defects), and organized clusters of these threads (pile-ups, or dark line defects). The overall surface defect density must include both categories to properly characterize the material. The lowest defect density, 4 × 105cm−2, was found in specimens grown at an average grading rate of 10% Ge per pm thickness.

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1. Fitzgerald, E. A., Xie, Y. H., Monroe, D., Silverman, P. J., Kou, J. M., Kortan, A. R., Thiel, F. A., and Weir, B. E., J. Vac. Sci. Tech. B, 10 (1992), 1807.
2. LeGoues, F. K., Meyerson, B. S., and Morar, J. F., Phys. Rev. Lett., 66 (1991), 2903.

Correlation Between Defect Density and Process Variables In Step-Graded, Relaxed Si0.7Ge0.3 Grown on Si by Rtcvd

  • G. Patrick Watson (a1), Eugene A. Fitzgerald (a1), Bahram Jalali (a1), Ya-Hong Xie (a1), Bonnie Weir (a1) and Leonard C. Feldman (a1)...

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