Hostname: page-component-7479d7b7d-767nl Total loading time: 0 Render date: 2024-07-11T01:16:26.500Z Has data issue: false hasContentIssue false
  • English
  • Français

Copper Grown Diamond Films

Published online by Cambridge University Press:  15 February 2011

E. Pereira ,
Qi Hua Fan  and
J. Gracio
E. Pereira
Affiliation:
Department of Physics, University of Aveiro, 3810 Aveiro, Portugal
Qi Hua Fan
Affiliation:
Department of Physics, University of Aveiro, 3810 Aveiro, Portugal
J. Gracio
Affiliation:
Department of Mechanical Engineering, University of Aveiro, 38 10 Aveiro, Portugal
Get access

Abstract

Diamond has been synthesised on copper using Microwave Plasma Chemical Vapour Deposition (MPCVD). The effect of substrate pre-treatment including different polishing and cleaning on diamond nucleation was investigated. It has been found that the residues from the polishing process played an important role in the diamond nucleation. Diamond films synthesised under optimised conditions presented a narrow 1332cm-1 Raman peak. During the ramp down procedure, diamond films usually cracked due to the large thermal mismatch between copper and diamond. To avoid this problem, the effect of growth temperature and deposition time was investigated and a two-step-growth method for stress relief is proposed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 436: Symposium CC – Thin Films Stresses and Mechanical Properties VI , 1996 , 323
Copyright
Copyright © Materials Research Society 1997

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Schwarzbach, D., Haubner, R. and Lux, B., Diamond and Related Materials, 3, p. 757 (1994)Google Scholar
2. Kobashi, K., Nishimura, K., Kawate, Y. and Horiuchi, T., Physical Review B, 38 (6), p.4067 (1988).Google Scholar
3. Zhu, W., Badzian, A.R., Messier, R., SPIE, 1325, Diamond Optics III, p. 18 7 (1990).Google Scholar
4. Bienk, E.J. and Eskildsen, S., Diamond and Related Materials, 2, p.432 (1993).Google Scholar
5. Lu, Z.P., Heberlein, J. and Pfender, E., Plasma Chemistry and Plasma Processing, 12(1), p. 35 (1992).Google Scholar
6. Kawarada, M., Kurihara, K. and Sasaki, K., Diamond and Related Materials, 2, p. 1083 (1993).Google Scholar
7. Hartsell, M.L. and Plano, L.S., J. Mater. Res., 9(4), p. 921 (1994).Google Scholar
8. Perry, S.S. and Somorjai, G.A., J. Vac. Sci. & Tech. (A), 12(4), p. 1513 (1994).Google Scholar
9. Ashfold, M.N.R., May, P.W., Rego, C.A. and Everitt, N.M., Chem. Soc. Rev., 23, p. 21 (1994).Google Scholar
10. Hoffman, R.W., in Physics Non-metallic Thin Films, edited by Dupuy, C.H.S. and Cachard, A. (Plenum, New York, 1974), p.306 Google Scholar