Skip to main content Accessibility help

Control and Impact of Processing Ambient During Rapid Thermal Silicidation

  • K. Maex (a1), E. Kondoh (a2), A. Lauwers (a2), A. Steegen (a2), M. De Potter (a2), P. Besser (a3) and J. Proost (a2)...


The introduction of rapid thermal processing for silicide formation has triggered a lot of research to temperature uniformity and reproducibility in RTP systems. In addition to the temperature, the ambient control is to be taken into account. Although gasses are specified to a low level of contaminants, the RTP step needs to be optimised for optimal contaminant reduction. Besides, the process wafer itself is a source of contamination.

In this paper an overview will be given of the role of RTP ambient on the silicidation processes. The effect of the wafer on ambient purity will be highlighted. It will be shown that the use of a reactive capping layer during silicidation represents an adequate solution for both sources of contamination.



Hide All
1. Maex, K., Mat. Sci. and Eng. (1993) 53151
2. “Advances in Rapid Thermal and Integrated Processing”, Edt. Roozeboom, F., (Kluwer Academic Pub., Dordrecht, Netherlands, 1996)
3. Wang, Q. F., Lauwers, A., Jonckx, F., de Potter, M., Chen, C.-C. and Maex, K., Mat. Res. Soc. Proc., Vol.402, (1996), 221
4. Norstrom, H., Maex, K., Romano-Rodriguez, A., Vanhellemont, J. and Van den, L hove Microelectronic Engineering 14 (1991) 327
5. Proost, J., Kondoh, E., Vereecke, G., Heyns, M. and Maex, K., J. Vac. Sci. Technol., in press
6. Kondoh, E., Vereecke, G., Heyns, M. M., Maex, K., Gutt, T. and Nényei, Z., Mat. Res. Soc. Proc., Vol.525, (1998)
7. Wang, Q.F., Maex, K., Kubicek, S., Jonckheere, R., Kerkwijk, B., Verbeeck, R., Biesemans, S. and De Meyer, K., Symp. on VLSI Techn., Kyoto, (1995), 17
8. A, Lauwers, Besser, P., de Potter, M., Kondoh, E., Roelandts, N., Steegen, A., Stucchi, M. and Maex, K., IEEE Proc. International Interconnect Technology Conference (IITC), (1998), to be published
9. Besser, P., Lauwers, A., Roelandts, N., Maex, K., Blum, W., Alvis, R., Stucchi, M., de Potter, M., Mat. Res. Soc. Proc., Vol.514, (1998)


Full text views

Total number of HTML views: 0
Total number of PDF views: 0 *
Loading metrics...

Abstract views

Total abstract views: 0 *
Loading metrics...

* Views captured on Cambridge Core between <date>. This data will be updated every 24 hours.

Usage data cannot currently be displayed