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Comparison of Electron Beam-Induced and Light-Induced Defect Saturation in a-Si:H

Published online by Cambridge University Press:  21 February 2011

M. Grimbergen ,
A. Lopez-Otero ,
A. Fahrenbruch ,
L. Benatar ,
D. Redfield ,
R. Bube  and
R. McConville
M. Grimbergen
Affiliation:
Stanford University, Depl of Materials Science and Engineering, Stanford, CA 94305
A. Lopez-Otero
Affiliation:
Stanford University, Depl of Materials Science and Engineering, Stanford, CA 94305
A. Fahrenbruch
Affiliation:
Stanford University, Depl of Materials Science and Engineering, Stanford, CA 94305
L. Benatar
Affiliation:
Stanford University, Depl of Materials Science and Engineering, Stanford, CA 94305
D. Redfield
Affiliation:
Stanford University, Depl of Materials Science and Engineering, Stanford, CA 94305
R. Bube
Affiliation:
Stanford University, Depl of Materials Science and Engineering, Stanford, CA 94305
R. McConville
Affiliation:
Raychem Corporation, Corporate Technology, Menlo Park, CA 94025
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Abstract

Generation, saturation, and annealing characteristics of metastable defects formed by electron beam irradiation at 20 keV and photon irradiation at 1.9 eV have been compared. Saturation density reached by electron irradiation is temperature independent over the range 225 K to 300 K, although a small activation energy of the generation rate may be present. This differs from observed temperature dependent light-induced saturation from 330 K to 470 K, although differences are expected because of the separate temperature ranges and dissimilar carrier excitation rates. The electron beam-induced saturated defect density is about 5 times larger than for light-induced saturation at 350 K and high light intensity (generation rate ≈ 1022cm-3s-1). Defects formed by electron irradiation anneal at 300 K with a stretched exponential time constant three orders of magnitude smaller than for light-induced defects. After electron irradiation, dark conductivity relaxes faster than photoconductivity. Once the dark Fermi level becomes constant during defect density relaxation, photoconductivity is inversely proportional to the defect density.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 258: Symposium A – Amorphous Silicon Technology – 1992 , 1992 , 443
Copyright
Copyright © Materials Research Society 1992

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References

REFERENCES

[1] Lee, C., Olsen, W., Taylor, P., Ullal, H., and Caesar, G., Phys. Rev. B 31, 100 (1985)Google Scholar
[2] Grimbergen, M., Benatar, L., Fahrenbruch, A., Lopez-Otero, A., Redfield, D. and Bube, R., AIP Conf. Proc. 234, 138 (1991)Google Scholar
[3] Street, R., Biegelsen, D., and Stuke, J., Phil. Mag. B 40, 212 (1979)Google Scholar
[4] Schneider, U. and Schroeder, B. in Amorphous Silicon and Related Materials, ed. Fritsche, A. (World Scientific, Singapore 1989) A, 687 Google Scholar
[5] Schneider, U., Schroeder, B., and Finger, F., J. Non-Cryst. Sol. 97&98, 795 (1987)CrossRefGoogle Scholar
[6] Scholz, A. and Schroeder, B., AIP Conf. Proc. 234, 178 (1991)Google Scholar
[7] Park, H., Liu, J., Roca i Cabaroccas, P., Maruyama, A., Isomura, M., Wagner, S., Abelson, J., and Finger, F., Appl. Phys. Lett. 57, 1440 (1990)Google Scholar
[8] Scholz, A. and Schroeder, B., J. Non-Cryst. Sol. 137&138, 259 (1991)Google Scholar
[9] Vanecek, M., Kocka, J., Stuchlik, J., Kosisek, Z., Stika, O. and Triska, A., Sol. Energy Matls. 8, 411 (1983)Google Scholar
[10] Grimbergen, M., unpublished.Google Scholar
[11] Wyrsch, N., Finger, F., McMahon, T., and Vanecek, M., J. Non-Cryst. Sol. 137&138, 357 (1991)Google Scholar
[12] Redfield, D. and Bube, R.H., Appl. Phys. Lett. 54, 1037 (1989)CrossRefGoogle Scholar
[13] Benatar, L., et. al., this volume.Google Scholar
[14] Klein, A., J. Appl. Phys. 39, 2029 (1968)Google Scholar
[15] Jackson, W. and Kakalios, J., Phys. Rev. B 37, 1020 (1988)Google Scholar
[16] Ritter, D., Zeldov, E., and Weiser, K., Phys. Rev. B 38, 8296 (1988)Google Scholar
[17] Kazanskii, A., Korol, A., Milichevich, E. and Chukichev, M., Sov. Phys. Semicond. 20, 1000 (1986)Google Scholar
[18] Bube, R., unpublished.Google Scholar