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Chemical Vapor Deposition of Vanadium Oxide Tiiin Films

  • Ogie Stewart (a1), Joan Rodriguez (a1), Keith B. Williams (a1), Gene P. Reck (a1), Narayan Malani (a2) and James W. Proscia (a2)...

Abstract

Vanadium oxide thin films were grown on glass substrates by atmospheric pressure chemical vapor deposition (APCVD) from the reaction of vanadium(IV) chloride with isopropanol and t-butanol. Films were deposited in the temperature range 250 to 450°C. The as-deposited films were a dark greenish color consistent with formation of a lower oxide of vanadium. Annealing a film deposited on Corning 7059 glass in air converted the material to a yellow film. X-ray diffraction of the yellow film revealed the presence of V2O5. Optical spectra of the films are presented. Glass substrates previously coated with conductive fluorine doped tin oxide were coated with V2O5 and evaluated for electrochromic activity.

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Chemical Vapor Deposition of Vanadium Oxide Tiiin Films

  • Ogie Stewart (a1), Joan Rodriguez (a1), Keith B. Williams (a1), Gene P. Reck (a1), Narayan Malani (a2) and James W. Proscia (a2)...

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