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Chemical Vapor Deposited β-SiC for Optics Applications

  • Jitendra S. Goela (a1), Michael A. Pickering (a1) and Raymond L. Taylor (a1)

Abstract

The fabrication, properties and optics applications of transparent and opaque Chemical Vapor Deposited (CVD) β-SiC are reviewed. CVD-SiC is fabricated by the pyrolysis of methyltrichlorosilane, in excess H2, in a low-pressure CVD reactor. The CVD process has been successfully scaled to produce monolithic SiC parts of diameter up to 1.5 m and thickness 2.5 cm. The characterization of CVD-SiC for important physical, optical, mechanical and thermal properties indicate that it is a superior material for optics applications. CVD-SiC properties are compared with those of the other candidate mirror and window materials. SiC process/property relationships are discussed, emphasizing the differences in process conditions, microstructure, and properties between transparent and opaque CVD-SiC.

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Chemical Vapor Deposited β-SiC for Optics Applications

  • Jitendra S. Goela (a1), Michael A. Pickering (a1) and Raymond L. Taylor (a1)

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