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Characterization of Thermally Annealed Sb Implanted Fused Silica

Published online by Cambridge University Press:  22 February 2011

S.H. Morgan ,
Z. Pan ,
D.O. Henderson ,
S.Y. Park ,
R.A. Weeks ,
R.H. Magruder III  and
R.A. Zuhr
S.H. Morgan
Affiliation:
Department of Physics, Fisk University, Nashville, TN 37208
Z. Pan
Affiliation:
Department of Physics, Fisk University, Nashville, TN 37208
D.O. Henderson
Affiliation:
Department of Physics, Fisk University, Nashville, TN 37208
S.Y. Park
Affiliation:
Department of Applied and Engineering Sciences, Vanderbilt University, Nashville, TN 37235
R.A. Weeks
Affiliation:
Department of Applied and Engineering Sciences, Vanderbilt University, Nashville, TN 37235
R.H. Magruder III
Affiliation:
Department of Applied and Engineering Sciences, Vanderbilt University, Nashville, TN 37235
R.A. Zuhr
Affiliation:
Solid State Division, Oak Ridge National Lab, Oak Ridge, TN 37831
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Abstract

The local environment of the polarizable ion in heavy metal oxide glasses is postulated to strongly influence the nonlinear response of these materials. We have previously observed that post-implantation thermal annealing changes the chemical properties of the implanted layer in a different fashion in Pb- and Bi- implanted SiO2. In this paper we report the optical behavior of Sb-implanted SiO2 as a function of annealing temperature and atmosphere. High purity fused silica substrates were implanted at room temperature to a dose of 6 × 1016 ions/cm2, and subsequently annealed at temperatures from 500 to 1000 C in argon and oxygen atmospheres. RBS, optical absorption (1.8 to 6.2 eV), infrared reflectance (450 to 5000 cm-1), and nonlinear index of refraction were measured before and after annealing. The results of these measurements indicate that annealing treatment significantly affects the local environment of the implanted Sb ions, and consequently the optical response.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 316: Symposium A – Materials Synthesis and Processing Using Ion Beams , 1993 , 469
Copyright
Copyright © Materials Research Society 1994

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References

REFERENCES

1 Lines, M.E., J. Appl. Phys. 69 (1991) 6876.Google Scholar
2 Friberg, S.R. and Smith, P.W., IEEE J. Quantum Electronics, QE–23 (1987) 2089.Google Scholar
3 Vogel, E.M., Weber, M.J. and Krol, D.M., Phys. Chem. of Glasses, 32 (1991) 231.Google Scholar
4 Hall, D.W., Newhouse, M.A., Borrelli, N.F., Dumbaugh, W.H., and Weidman, D.L., Appl. Phys. Lett., 54 (1989) 1293.Google Scholar
5 Newhouse, M.A., Weidman, D.L., and Hall, D.W., Opt. Lett., 15 (1990) 1185.Google Scholar
6 Sheik-Bahae, M., Said, A.A., Wei, T., Hagan, D.J. and Van Stryland, E.W., IEEE J. Quan turn Elect. 26 (1990) 760.Google Scholar
7 Galeener, F.L. and Lucovsky, G., Phys. Rev. Lett. 37 (1976) 1474.Google Scholar
8 Arnold, G.W. and Mazzoldi, P., Ion Beam Modification of Insulators, edited by Mazzoldi, P. and Arnold, G.W. (Elsevier Science Publishers, Amsterdam, 1987).Google Scholar
9 Weeks, R.A., Materials Science and Technology. Vol 9, Zarzycki, J., ed., VCH, Weinheim (1991)Google Scholar
10 Mie, G., Ann. Phys. 25 (1908) 377.Google Scholar
11 Bohren, C.F. and Huffman, D.R., Absorption and Scattering of Light by Small Particles, John Wiley and Sons, New York (1983).Google Scholar
12 Kreibig, U. and Genzel, L., Surf. Sci. 156 (1985) 678.Google Scholar
13 Creighton, J.A. and Eadon, D.G., J. Chem. Soc. Faraday Trans. (1991) 3881.Google Scholar
14 Magruder, R.H. III, Henderson, D.O., Morgan, S.H. and Zuhr, R.A., J. Non-Cryst. Sol. 152 (1993) 258.Google Scholar
15 Henderson, D.O., Morgan, S.H., Mu, R., Magruder, R.H. III, Anderson, T.S., Wittig, J.E., and Zuhr, R.A., Proc. SPIE 1761, 1992 191.Google Scholar
16 Morgan, S.H., Henderson, D.O., Pan, Z., Magruder, R.H. III and Zuhr, R.A., Proc. Mat. Res. Soc. 279 (1993).Google Scholar
17 Haglund, R.F., Yang, L., Magruder, R.H. III, Wittig, J., Becker, K. and Zuhr, R.A., Opt. Lett. 18 (1993) 373.Google Scholar