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Characterization of Reactively Sputtered Titanium Carbide Films by Analytical Electron Microscopy

Published online by Cambridge University Press:  25 February 2011

J. Tafto ,
G. Rajeswaran  and
T. Saulys
J. Tafto
Affiliation:
Metallurgy and Materials Science Division, Brookhaven National Laboratory, Upton, NY 11973
G. Rajeswaran
Affiliation:
Metallurgy and Materials Science Division, Brookhaven National Laboratory, Upton, NY 11973
T. Saulys
Affiliation:
Metallurgy and Materials Science Division, Brookhaven National Laboratory, Upton, NY 11973
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Abstract

TICx films prepared by reactive sputtering using a Ti target and different methane partial pressures were characterized by analytical transmission electron microscopy. The films are polycrystalline, and the plasmon energy increases considerably with increasing carbon content. Combination of the information obtained from electron energy loss plasmon and core loss spectra, and electron diffraction indicates that x in TiCx increases linearly with methane partial pressure. We find that the face centered cubic TIC phase spans the composition from TiC0.2 to TiC1.0 and when x<l we have a mixture of TiC1.0 and amorphous C.

Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 62: Symposium Q – Materials Problem Solving with the Transmission Electron Microscope , 1985 , 421
Copyright
Copyright © Materials Research Society 1986

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References

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