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Characterization of Mocvd Grown Epitaxial Ceramic Oxide Thin Films
Published online by Cambridge University Press: 21 February 2011
Abstract
Characterization of TiO2 films grown by the MOCVD technique was carried out using micro-Raman scattering. The effects of processing parameters on the film composition and morphology were investigated. The micro-Raman technique was shown to be a useful tool for characterizing oxide thin films grown by the MOCVD technique.
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- Copyright © Materials Research Society 1990
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