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Characterization Of Inorganic Contamination In Liquid Crystal Display Materials Using Total Reflection X-Ray Fluorescence (TXRF)

  • R. S. Hockett (a1) and J. M. Metz (a1)

Abstract

This work is a feasibility study for using Total reflection X-Ray Fluorescence (TXRF) to characterize inorganic contamination at the surface of, and in, liquid crystal display materials as a function of their processing. Five samples were taken from process steps called: Cr black mask, Cr pattern, RGB pattern, topcoat, and ITO, all on glass substrates. TXRF, a glancing angle XRF technique, is sensitive to inorganic elements and can be used to detect inorganic contamination at surfaces. In addition, increasing the glancing angle can lead to penetration of thin films, and thereby to some qualitative depth information for the detected elements. Elements detected in this study included: Al, Si, S, Cl, In/Sn, Ca, Ba, Cr, Fe, Cu, Ni and Zn.

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[1] Lee, J. J., Lindley, P. M. and Odom, R. W., ”Surface Analysis of LCD Materials in Various Stages of Production by Time-of-Flight Secondary Ion Mass Spectrometry (TOF-SIMS),” this Materials Research Society Symposium, San Francisco, April 1994.
[2] Hockett, R. S., ”High Sensitivity Characterization of Contamination on Silicon Surfaces Using TXRF,” IES 1993 Proceedings Volume 1, published by Institute of Environmental Sciences (Mount Prospect, IL), pp. 432459, (1993).
[3] lida, A., Sakurai, K., Yoshinaga, A., and Goshi, Y., ”Grazing incidence X-ray fluorescence analysis,” Nuclear Instruments and Methods in Physics Research, A246, 736 (1986).
[4] Hockett, R. S., ”TXRF Semiconductor Applications,” Advances in X-Ray Analysis. Vol.37, Plenum Press (1994)
[5] Eichinger, P., Rath, H. J. and Schwenke, H., ”Application of Total Reflection X-Ray Fluorescence Analysis for Metallic Trace Impurities on Silicon Wafer Surfaces,” Semiconductor Fabrication: Technology and Metrology. ASTM STP 990, Gupta, D. editor, American Society for Testing and Materials, pp. 305313 (1989).
[6] Weisbrod, U., Gutschke, R., Knoth, J., and Schwenke, H., ”X-ray fluorescence spectrometry at grazing incidence for quantitative surface and layer analysis,” Fresenius J Anal Chem 341, pp. 8386, (1991).

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