This work is a feasibility study for using Total reflection X-Ray Fluorescence (TXRF) to characterize inorganic contamination at the surface of, and in, liquid crystal display materials as a function of their processing. Five samples were taken from process steps called: Cr black mask, Cr pattern, RGB pattern, topcoat, and ITO, all on glass substrates. TXRF, a glancing angle XRF technique, is sensitive to inorganic elements and can be used to detect inorganic contamination at surfaces. In addition, increasing the glancing angle can lead to penetration of thin films, and thereby to some qualitative depth information for the detected elements. Elements detected in this study included: Al, Si, S, Cl, In/Sn, Ca, Ba, Cr, Fe, Cu, Ni and Zn.