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Characterization Of Inorganic Contamination In Liquid Crystal Display Materials Using Total Reflection X-Ray Fluorescence (TXRF)

Published online by Cambridge University Press:  15 February 2011

R. S. Hockett
Affiliation:
Charles Evans & Associates, 301 Chesapeake Drive, Redwood City, CA 94063
J. M. Metz
Affiliation:
Charles Evans & Associates, 301 Chesapeake Drive, Redwood City, CA 94063
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Abstract

This work is a feasibility study for using Total reflection X-Ray Fluorescence (TXRF) to characterize inorganic contamination at the surface of, and in, liquid crystal display materials as a function of their processing. Five samples were taken from process steps called: Cr black mask, Cr pattern, RGB pattern, topcoat, and ITO, all on glass substrates. TXRF, a glancing angle XRF technique, is sensitive to inorganic elements and can be used to detect inorganic contamination at surfaces. In addition, increasing the glancing angle can lead to penetration of thin films, and thereby to some qualitative depth information for the detected elements. Elements detected in this study included: Al, Si, S, Cl, In/Sn, Ca, Ba, Cr, Fe, Cu, Ni and Zn.

Type
Research Article
Copyright
Copyright © Materials Research Society 1994

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References

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