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Characterization of High Surface Area Silicon Oxynitrides
Published online by Cambridge University Press: 25 February 2011
Abstract
High surface area silicon oxynitrides have been prepared by nitrida- tion of silica with ammonia. Characterization by Fourier-transform infrared spectroscopy has allowed quantitative determination of hydroxyl, amido and imido groups. Data obtained by X-ray photoelectron spectroscopy show that the nitrogen is well distributed in the surface of the materials.
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- Copyright © Materials Research Society 1992
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