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Characterization of High Surface Area Silicon Oxynitrides

  • Peter W. Lednor (a1), Rene De Ruiter (a1) and Kees A. Emeis (a1)

Abstract

High surface area silicon oxynitrides have been prepared by nitrida- tion of silica with ammonia. Characterization by Fourier-transform infrared spectroscopy has allowed quantitative determination of hydroxyl, amido and imido groups. Data obtained by X-ray photoelectron spectroscopy show that the nitrogen is well distributed in the surface of the materials.

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