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Characterisation of Pointed Indentation Fracture of Thin Silica Films on a Ductile Substrate.

Published online by Cambridge University Press:  22 February 2011

M. Samandi
Affiliation:
Department of Materials Engineering, The University of Wollongong, Wollongong, N.S.W 2500
T. J. Bell
Affiliation:
CSIRO, Division of Applied Physics, Lindfield, N.S.V. 2070, Australia
M. V. Swain
Affiliation:
CSIRO, Division of Applied Physics, Lindfield, N.S.V. 2070, Australia
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Abstract

Observations are presented of the indentation of amorphous silica films of different thickness on mild steel substrates. The films were prepared by sol—gel dip coating and sintering at 500° C. Indentation of the films with a Berkovich indenter using an ultra micro—indentation hardness system (UMIS) revealed a critical load for the fracture of the thin films. The variation of the fracture load was characterised by a Weibull analysis that gave a mean fracture load and a Weibull modulus. The latter was found to be nearly independent of film thickness whereas the former varied with the square of the thickness.

Type
Research Article
Copyright
Copyright © Materials Research Society 1992

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References

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