Hostname: page-component-76fb5796d-2lccl Total loading time: 0 Render date: 2024-04-25T09:51:33.068Z Has data issue: false hasContentIssue false
  • English
  • Français

C11b/C40 Lamellar Structure in a Ta-added Molybdenum Disilicide

Published online by Cambridge University Press:  21 March 2011

Fu-Gao Wei ,
Yoshisato Kimura  and
Yoshinao Mishima
Fu-Gao Wei
Affiliation:
Department of Materials Science and Engineering, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226–8502, Japan
Yoshisato Kimura
Affiliation:
Department of Materials Science and Engineering, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226–8502, Japan
Yoshinao Mishima
Affiliation:
Department of Materials Science and Engineering, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226–8502, Japan
Get access

Abstract

C11b/C40 fully lamellar microstructures, similar to the well-known TiAl/Ti3Al lamellae, were obtained in Ta- and Nb-added MoSi2 polycrystalline alloys in a previous work. In the present study, the crystallography of the lamellar structure is investigated in a MoSi2-15mol%TaSi2 pseudo-binary alloy after homogenized at 1400°C for 168h, in order to provide some useful parameters for microstructural control to improve mechanical properties. The orientation relationship between C11b and C40 phases and its three distinct variants were identified. Coherency of the lamellar interface is analyzed in comparison with the TiAl/Ti3Al lamellae. Approach to modify the C11b/C40 lamellar microstructure to increase its coherency is discussed based on the results obtained.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 646 , 2000 , N5.37.1
Copyright
Copyright © Materials Research Society 2001

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCE

1. Mirkin, I.L., and Kancheev, O.D., Met. Sci. Heat Treat., 1/2, 10(1967).Google Scholar
2. Darolia, R., Lahrman, D.F. and Rield, R., Scr. metall. mater., 26, 1007(1992).Google Scholar
3. Huang, S.C., Metall. Trans., 23A, 375(1992).Google Scholar
4. Wei, F.G., Kimura, Y. and Mishima, Y., JIM Symp. Proc., 1999.Google Scholar
5. Nakano, T., Azuma, M. and Umakoshi, Y., Intermetallics, 6, 715(1998).Google Scholar