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Atomistic Simulations of Displacement Cascades in Fused Silica: It is Compared with Different Concentration of H in the Bulk

  • Fernando Mota (a1), Maria Jose Caturla (a2), Jose Manuel Perlado (a3), Angel Ibarra (a4) and Joaquin Molla (a5)...

Abstract

Amorphous Silica is one of candidate materials for both final focusing optics of lasers for NIF and future inertial fusion reactors and diagnostics of the Safety and Control Systems of the ITER machine as well as DEMO magnetic fusion reactors. In operation, these materials will be exposed to high neutron irradiation fluxes and it can result in point defect and vary the optical absorption, that is, degradation of the optical properties. In this paper we present molecular dynamic simulation of displacement cascade due to energetic recoils in amorphous silica without hydrogen atoms and with 1% of hydrogen atoms trying to identify defects formation. We have made a statistics of the different kind of defects at different energy of primary knock-on atoms (PKA). The range of studied PKA energies are from 400 eV to 3.5 keV and it is made to both component of this material Silicon and Oxygen.

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Keywords

Atomistic Simulations of Displacement Cascades in Fused Silica: It is Compared with Different Concentration of H in the Bulk

  • Fernando Mota (a1), Maria Jose Caturla (a2), Jose Manuel Perlado (a3), Angel Ibarra (a4) and Joaquin Molla (a5)...

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