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Atomic Layer Deposition of Indium Sulfide Layers for Copper Indium Gallium Diselenide Solar Cells

Published online by Cambridge University Press:  21 March 2011

F. Donsanti
Affiliation:
Laboratoire d'Electrochimie et de Chimie Analytique (UMR CNRS 7575), Ecole Nationale Supérieure de Chimie de Paris, 11 rue Pierre et Marie Curie 75231, Paris cedex 05, France
B. Weinberger
Affiliation:
Laboratoire d'Electrochimie et de Chimie Analytique (UMR CNRS 7575), Ecole Nationale Supérieure de Chimie de Paris, 11 rue Pierre et Marie Curie 75231, Paris cedex 05, France
P. Cowache
Affiliation:
Laboratoire d'Electrochimie et de Chimie Analytique (UMR CNRS 7575), Ecole Nationale Supérieure de Chimie de Paris, 11 rue Pierre et Marie Curie 75231, Paris cedex 05, France
M. C. Bernard
Affiliation:
Groupe de Physique des Liquides et Electrochimie (UPR CNRS 15), Université Pierre et Marie Curie, 4 place Jussieu, 75232 Paris cedex 05, France
D. Lincot
Affiliation:
lincot@ext.jussieu.fr
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Abstract

Growth and properties of indium sulfide layers (< 300 nm) prepared by atomic layer deposition (ALD) have been studied. Growth rate of about 0.6 A per cycle has been measured for films deposited at 160°C from indium acetylacetonate and hydrogen sulfide precursors. The films are crystalline with the β modification. They possess high band gap values (2.7-2.8 eV) which are related to small grain sizes (3-4 nm) through quantum size effects. Electrical properties have been addressed using the semiconductor electrolyte junction. They are n type with a doping level around 1016 cm−3 and possess a good blocking behavior under reverse bias. The flat band potential is close to -1 V vs MSE. These figures are close to those measured under similar conditions with CdS CBD buffer layers and could explain the good cell performances obtained with ALD In2S3.

Type
Research Article
Copyright
Copyright © Materials Research Society 2001

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References

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