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Approaches to modifying solid phase crystallization kinetics for a-Si films

Published online by Cambridge University Press:  10 February 2011

Reece Kingi ,
Yaozu Wang ,
Stephen Fonash ,
Osama Awadelkarim  and
Yuan-Mn Li
Reece Kingi
Affiliation:
Electronic Materials and Processing Research Laboratory, The Pennsylvania State University, University Park, PAl 6802
Yaozu Wang
Affiliation:
Electronic Materials and Processing Research Laboratory, The Pennsylvania State University, University Park, PAl 6802
Stephen Fonash
Affiliation:
Electronic Materials and Processing Research Laboratory, The Pennsylvania State University, University Park, PAl 6802
Osama Awadelkarim
Affiliation:
Electronic Materials and Processing Research Laboratory, The Pennsylvania State University, University Park, PAl 6802
Yuan-Mn Li
Affiliation:
Electronic Materials and Processing Research Laboratory, The Pennsylvania State University, University Park, PAl 6802
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Abstract

Three approaches to modifying the solid phase crystallization kinetics of amorphous silicon thin films are examined with the goal of reducing the thermal budget and improving the poly-Si quality for thin film transistor applications. The three approaches consist of (1) variations in the PECVD a-Si deposition parameters; (2) the application of pre-fumace-anneal surface treatments; and (3) using both rapid thermal annealing and furnace annealing at different temperatures. We also examine the synergism among these approaches.

Results reveal that (1) film deposition dilution and dilution/temperature changes do not strongly affect crystallization time, but do affect grain size; (2) pre-anneal surface treatments can dramatically reduce the solid phase crystallization thermal budget for diluted films and act synergistically with deposition dilution or dilution/temperature effects; and (3) rapid thermal annealing leads to different crystallization kinetics from that seen for furnace annealing.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 424: Symposium H – Flat Panel Display Materials II , 1996 , 249
Copyright
Copyright © Materials Research Society 1997

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