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Application of Laser Microetching in Formation of Air-Bearing Surface for Magnetic Head Sliders

Published online by Cambridge University Press:  15 February 2011

Y.F. LU
Affiliation:
Department of Electrical Engineering, National University of Singapore, 10 Kent Ridge Crescent, Singapore 119260
K.D. YE
Affiliation:
Department of Electrical Engineering, National University of Singapore, 10 Kent Ridge Crescent, Singapore 119260
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Abstract

Laser-induced etching of polycrystalline Al2O3TiC material by a tightly-focused CW Ar ion laser has been investigated in a KOH solution with different concentrations. It is found that the KOH concentration can strongly affect the etching quality where low KOH concentration can result in rough and irregular patterns. The etching effect is also related to laser power and scanning speed. Laser-induced etching of polycrystalline AI2O3TiC in a KOH solution is found to be a photothermal reaction in which a threshold laser power exists. With an appropriate set of etching parameters, well defined grooves can be obtained with clean side walls and with an etching rate up to several hundred micrometers per second. It is also found that the grains in the polycrystalline Al2O3TiC material play an important role in the etching dynamics and etching quality. This etching process is believed to be applicable to the formation of a slider surface of magnetic heads in the future.

Type
Research Article
Copyright
Copyright © Materials Research Society 1996

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References

REFERENCES

1 Osgood, R.M. Jr., Brueck, S.R.J., and Schlossberg, H.R. (eds.), Laser Diagnostics and Photochemical Processing for Semiconductors (North-Holland, Amsterdam, 1983)Google Scholar
2 Ehrlich, D.J. and Tsao, J.Y. (eds.), Laser Microfabrication - Thin Film Processes and Lithography, (Academic, San Diego, 1989)Google Scholar
3 Boyd, I.W. and Rimini, E. (eds.), Beam Processing and Laser Chemistry, (North-Holland, Amsterdam, 1989)Google Scholar
4 Takai, M., Lu, Y.F., Koizumi, T., Nagatomo, S., and Namba, S., Appl. Phys. A 46, 197(1988)Google Scholar
5 Lu, Y.F., Takai, M., Nagatomo, S., and Namba, S., Appl. Phys. A 47, 319(1988)Google Scholar
6 Lu, Y.F., Takai, M., Nagatomo, S., Minamisono, T., and Namba, S., Jpn. J. Appl. Phys. 28, 2151(1989)Google Scholar
7 Lu, Y.F., Takai, M., Chayahara, A., Satou, M., Sanda, H., Nagatomo, S., and Namba, S., Jpn J. Appl. Phys. 29, 2260(1990)Google Scholar
8 Lu, Y.F., Takai, M., Nakata, T., Nagatomo, S., and Namba, S., Appl. Phys. A 52, 129(1991)Google Scholar
9 Gutfeld, R.J., and Hodgson, R.T., Appl. Phys. Lett. 40, 352(1982)Google Scholar
10 Lu, Y.F., Takai, M., Nagatomo, S., and Namba, S., Appl. Phys. B 53, 39(1991)Google Scholar