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Application of Ftir Spectroscopy to the Characterization of as-Deposited and Chemical Mechanical Polished (CMP) Electron Cyclotron Resonance (ECR) Plasma Based SiO2 Films

  • Mukesh Desai (a1), Ron Carpio, Rahul Jairath (a2), Matt Stell (a3) and Robert Tolles...

Abstract

FTIR spectroscopy has been used to characterize as-deposited and chemical mechanical polished (CMP) electron cyclotron resonance (ECR) plasma based SiOx films. The ECR films were deposited at different O2/SiH4 gas ratios in an attempt to vary the film stochiometry. Transmission and reflectance-absorbance IR spectral data were combined with CMP removal rate information to characterize the SiOx films and their polishing behavior. The asymmetric O-Si-O stretching (ASM) and Si-OH vibrational bands were found to be principal sources of information.

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1. Davari, B. et al, IEDM Tech. Digest 1989, pg 61, IEEE, 1989
2. Jairath, R. et al, Proc. Advanced Metallization for ULSI Applications (in press), 1993.
3. Trogolo, J.A. & Rajan, K, Proc. Mat. Res. Soc., Vol 260, pg 869, 1992
4. Cohen, S.A. et al, J. Electrochem. Soc., Vol 139, No. 12, pg 3572, 1992
5. Theil, J.A. et al, J. Vac. Sci. Technol. A, Vol 8, No. 3, pg 1374, 1990

Application of Ftir Spectroscopy to the Characterization of as-Deposited and Chemical Mechanical Polished (CMP) Electron Cyclotron Resonance (ECR) Plasma Based SiO2 Films

  • Mukesh Desai (a1), Ron Carpio, Rahul Jairath (a2), Matt Stell (a3) and Robert Tolles...

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