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Anomalous Selective Tungsten- Growth by -Chemical- Vapor -Deposition

  • Yu-Jane Mei (a1), Ting-Chang Chang (a2), Jeng-Dong Sheu (a1), Wen-Kuan Yeh (a1), Fu-Ming Pan (a2) and Chun-Yen Chang (a1)...

Abstract

Selective tungsten chemical vapor deposition (W-CVD) is one of the most attractive technique for filling deep submicron contact hole and via hole for the ULSI application. In this work, we firstly find out the anomalous selective W growth for the contact hole. The tungsten only nucleates from the side ring of the contact hole bottom. Several predeposition treatments prior to W growth can improve this anomalous feature and excellently selective W growth can be achieved. Auger electron spectroscopy (AES) is utilized to investigate the interface of Si/W. A model has been proposed to explain this anomalous selective tungsten growth.

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Anomalous Selective Tungsten- Growth by -Chemical- Vapor -Deposition

  • Yu-Jane Mei (a1), Ting-Chang Chang (a2), Jeng-Dong Sheu (a1), Wen-Kuan Yeh (a1), Fu-Ming Pan (a2) and Chun-Yen Chang (a1)...

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