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Analysis of Electrodeposited NiFe Thin Films for the Development of Planar Fluxgate Magnetic Sensors

  • Thais Cavalheri dos Santos (a1) and Marcelo Mulato (a1)

Abstract

Nife alloys are potential candidates for the development of planar fluxgate magnetic microsensors. In this work, electrodeposition was used to produce NiFe thin films on top of copper substrates. When using this technique the variation of the electric potential, and thus the current density, alters the final stoichiometry of the deposited films, while the final thickness is determined by the total deposition time. We used current densities varying from 4.0 mA/cm2 to 28 mA/cm2, with steps of 4.0 mA/cm2. For each current density, total deposition times of 10, 20, 30 and 40 minutes were used. The morphology was characterized using scanning electron microscopy, structure was characterized using X-ray diffraction experiments, and the composition of the films were determined using energy dispersive spectroscopy. The magnetic properties were investigated evaluating the materials hysteresis cycle. The materials were optimized aiming for lowest coercivity values, and the final result was about 0.215 kA/m.

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Analysis of Electrodeposited NiFe Thin Films for the Development of Planar Fluxgate Magnetic Sensors

  • Thais Cavalheri dos Santos (a1) and Marcelo Mulato (a1)

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