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Adherence of Diamond Films Produced by Microwave Plasma Deposition on Sialon Tool Inserts

Published online by Cambridge University Press:  22 February 2011

Robert C. McCune ,
D. W. Hoffman ,
T. J. Whalen  and
C. O. McHugh
Robert C. McCune
Affiliation:
Ford Motor Company, P.O. Box 2053, Dearborn, MI 48121-2053
D. W. Hoffman
Affiliation:
Ford Motor Company, P.O. Box 2053, Dearborn, MI 48121-2053
T. J. Whalen
Affiliation:
Ford Motor Company, P.O. Box 2053, Dearborn, MI 48121-2053
C. O. McHugh
Affiliation:
Ford Motor Company, P.O. Box 2053, Dearborn, MI 48121-2053
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Abstract

The adherence of diamond films produced by microwave-enhanced chemical vapor deposition (CVD) on SiAlON tool inserts was assessed by scratch, indentation and machining tests on aluminum alloys. While the films are nominally adherent during handling and mild cutting operations, the measured adherence values are appreciably lower than values associated with conventional CVD coatings on cobalt-tungsten carbide cutting inserts. An indentation type adhesion test using polished substrates was found to yield reproducible behavior for interfacial crack extension at loads ranging from 15 to 150 kg. The “critical load” in scratch testing was found to be less than 10 N.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 130: Symposium C – Thin Films: Stresses and Mechanical Properties I , 1988 , 261
Copyright
Copyright © Materials Research Society 1989

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