Hostname: page-component-76fb5796d-45l2p Total loading time: 0 Render date: 2024-04-25T10:33:22.368Z Has data issue: false hasContentIssue false
  • English
  • Français

Thin Film Adhesion to Ion Bombarded Surfaces

Published online by Cambridge University Press:  21 February 2011

P. Anders Ingemarsson  and
T. A. Tombrello
P. Anders Ingemarsson
Affiliation:
Dept. of Radiation Sciences, Uppsala University, Box 535, S-751 21 Uppsala, Sweden
T. A. Tombrello
Affiliation:
California Institute of Technology, Pasadena, California 91125, U.S.A.
Get access

Abstract

We report on the use of 20 MeV C14+ ion beams for pre-irradiation of Si, SiO2 and Al2O3 surfaces with resulting alterations in the adhesion of subsequently deposited Au and Ag thin films. The effect does not follow the same pattern for Au and Ag films, nor is there a simple correlation to the previously observed adhesion effect induced by ion irradiation after film deposition. Possible mechanisms, both for pre-irradiation and post-irradiation effects, are discussed, as is the importance of chemical structures with respect to interfacial bond strength.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 119: Symposium F – Adhesions in Solids , 1988 , 103
Copyright
Copyright © Materials Research Society 1988

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Bodö, P. and Sundgren, J. E., J. Vac. Sci. Technol., A2, 1498 (1984).Google Scholar
2. Sessler, G. M., West, J. E., Ryan, F. W. and Schonhorn, H., J. Pol. Sc. 17, 3199 (1973).Google Scholar
3. Ingemarsson, P. A., Ericsson, T., Gustavsson-Seidel, A., Possnert, G., Sundqvist, B. U. R. and Wäippling, R., Proceedings of the 12th International Conference of Hosei University on “Application of Ion Beams in Materials Science”, Tokyo, Japan, September, 1987.Google Scholar
4. Mitchell, I. V., Williams, J. S., Smith, P. and Elliman, R. G. Appl. Phys. Lett. 44, 193 (1984).Google Scholar
5. Werner, B. T., Vreeland, T., Mendenhall, M. H., Qiu, Y. and Tombrello, T. A. Thin Solid Films 104, 163 (1983).Google Scholar
6. Dallaporta, H. and Cros, A., Appl. Phys. Lett. 48, 1357 (1986).Google Scholar
7. Yuanxun Qiu, Griffith, J. E., Meng, Wen An and Tombrello, T. A. Radiation Effects 70, 231 (1983).Google Scholar
8. Qiu, Yuanxun Griffith, J. E. and Tombrello, T. A., Radiation Effects 64, 111 (1982).Google Scholar
9. Mendenhall, M. H., Ph. D. Thesis, California Institute of Technology, 1983.Google Scholar
10. Bauer, R. S., Bachrach, R. Z. and Brillson, L. J., Appl. Phys. Lett. 37, 1006 (1980).Google Scholar
11. Kelly, R., Surface Sci. 90, 280 (1979).Google Scholar
12. Ibach, H., Bruchmann, H. D. and Wagner, H., Appl. Phys. B29, 113 (1982).Google Scholar
13. Headrick, R. L. and Seiberling, L. E., Mat. Res. Soc. Symp. Proc. 35, 539 (1985).Google Scholar
14. Baglin, J. E. E., Mat. Res. Soc. Symp. Proc. 47. 3 (1985).Google Scholar
15. Ingemarsson, P. A., Spicklemire, S., Tombrello, T. A. and Weathers, D., To be published.Google Scholar
16. Baglin, J. E. E., Schrott, A. G., Thompson, R. D., Tu, K. N. and Segmuller, A. Nucl. Instr. Meth. B19/20, 782 (1987).Google Scholar