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Structure of Cu Ions in (Cu + Halogen or Chalcogen)-Ion Implanted Silica Glasses

Published online by Cambridge University Press:  01 February 2011

Kohei Fukumi
Affiliation:
National Institute of Advanced Industrial Science and Technology, Kansai Center, 1–8–31, Midorigaoka, Ikeda, Osaka, 563–8577, Japan
Akiyoshi Chayahara
Affiliation:
National Institute of Advanced Industrial Science and Technology, Kansai Center, 1–8–31, Midorigaoka, Ikeda, Osaka, 563–8577, Japan
Hiroyuki Kageyama
Affiliation:
National Institute of Advanced Industrial Science and Technology, Kansai Center, 1–8–31, Midorigaoka, Ikeda, Osaka, 563–8577, Japan
Naoyuki Kitamura
Affiliation:
National Institute of Advanced Industrial Science and Technology, Kansai Center, 1–8–31, Midorigaoka, Ikeda, Osaka, 563–8577, Japan
Kohei Kadono
Affiliation:
National Institute of Advanced Industrial Science and Technology, Kansai Center, 1–8–31, Midorigaoka, Ikeda, Osaka, 563–8577, Japan
Atsushi Kinomura
Affiliation:
National Institute of Advanced Industrial Science and Technology, Kansai Center, 1–8–31, Midorigaoka, Ikeda, Osaka, 563–8577, Japan
Yoshiyuki Mokuno
Affiliation:
National Institute of Advanced Industrial Science and Technology, Kansai Center, 1–8–31, Midorigaoka, Ikeda, Osaka, 563–8577, Japan
Yuji Horino
Affiliation:
National Institute of Advanced Industrial Science and Technology, Kansai Center, 1–8–31, Midorigaoka, Ikeda, Osaka, 563–8577, Japan
Junji Nishii
Affiliation:
National Institute of Advanced Industrial Science and Technology, Kansai Center, 1–8–31, Midorigaoka, Ikeda, Osaka, 563–8577, Japan
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Abstract

Structure of Cu ions in (Cl+Cu)-, (Br+Cu)-, (I+Cu)-, (S+Cu)- and (Se+Cu)-ion implanted silica glasses has been studied by x-ray absorption and optical absorption spectroscopies. Cu ions formed Cu-O bonds in the as-implanted glasses, due to the homogeneous distribution of Cu ions and the low local concentration of halogen and chalcogen ions in silica glass. Heat treatment at about 600°C caused the formation of bonds between Cu ions and halogen/chalcogen ions without forming Cu halide or chalcogenide crystals. It was deduced that the formation of these bonds was controlled by the diffusion of Cu ions in silica glass. On the other hands, it was inferred that the formation of Cu halide and chalcogenide crystals was controlled not only by the diffusion of halogen/chalcogen ions but also by the diffusion of matrix ions.

Type
Research Article
Copyright
Copyright © Materials Research Society 2004

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References

1. Fukumi, K., Chayahara, A., Kitamura, N., Akai, T., Hayakawa, J., Fujii, K. and Satou, M., J. Non-Cryst. Solids 178, 155 (1994).CrossRefGoogle Scholar
2. Fukumi, K., Chayahara, A., Kageyama, H., Kadono, K., Akai, T., Kitamura, N., Mizoguchi, H., Horino, Y., Makihara, M., Fujii, K. and Hayakawa, J., J. Non-Cryst. Solids 259, 93 (1999).CrossRefGoogle Scholar
3. Pham, M.T., Möller, D., Hüller, J. and Albrecht, J., J. Appl. Phys. 79[8], 3915 (1996).CrossRefGoogle Scholar
4. Meldrun, A., White, C.W., Boatner, L.A., Anderson, I.M., Zuhr, R.A., Sonder, E., Budai, J.D. and Henderson, D.O., Nucl. Instrum. Methods B148, 957 (1999).CrossRefGoogle Scholar
5. Nakao, S., Wang, S.X., Wang, L.M., Ikeyama, M., Miyagawa, Y. and Miyagawa, S., Nucl. Instrum. Methods B175/177, 202 (2001).CrossRefGoogle Scholar
6. White, C.W., Budai, J.D., Zhu, J.G., Withrow, S.P., Zuhr, R.A., Hembree, D.M. Jr, Henderson, D.O., Ueda, A., Tung, Y.S., Mu, R. and Magruder, R.H., J. Appl. Phys. 79[4], 1876 (1996).CrossRefGoogle Scholar
7. Kingery, W.D., Bowen, H.K. and Uhlmann, D.R., Introduction to Ceramics, 2nd edition, (Wiley, New York, 1960), Chap. 9, pp. 381447.Google Scholar
8. Brese, N.E. and O'Keeffe, M., Acta Cryst. B47, 192 (1991).CrossRefGoogle Scholar
9. Stern, E.A., Sayers, D.E. and Lytle, F.W., Phys. Rev. B11[12], 4836 (1975).CrossRefGoogle Scholar
10. Teo, B.K. and Lee, P.A., J. Am. Chem. Soc. 101[11], 2815 (1979).CrossRefGoogle Scholar
11. Fukumi, K., Chayahara, A., Kageyama, H., Kinomura, A., Mokuno, Y., Kitamura, N., Kadono, K., Horino, Y. and Nishii, J., Nucl. Instrum. Methods B206, 353 (2003).CrossRefGoogle Scholar
12. Fukumi, K., Chayahara, A., Kinomura, A., Kageyama, H., Kadono, K., Kitamura, N., Nishii, J. and Horino, Y., J. Mat. Res. 18[4] 885 (2003).CrossRefGoogle Scholar
13. Bianconi, A., in X-ray Absorption: Principl, Applications, Techniques of EXAFS, SEXAFS and XANES, edited by Koningsberger, D.C. and Prins, R. (Weily, New York, 1988), Chap. 11, pp. 573662.Google Scholar
14. Freer, R., J. Mat. Sci. 15, 803 (1980).CrossRefGoogle Scholar
15. Tsouskala, D., Tsamis, C. and Normand, P., J. Appl. Phys. 89, 7809 (2001).Google Scholar
16. Kalen, J. D., Boyce, R. S. and Cawley, D., J. Am. Ceram. Soc. 74, 203 (1991).CrossRefGoogle Scholar
17. McMrayer, J. D., Swanson, R. M. and Sigmon, T. W., J. Electrochem. Soc. 133, 1242 (1986).CrossRefGoogle Scholar
18. Shacham-Diamand, Y., Dedhia, A., Hoffstetter, D. and Oldham, W. G., J. Electrochem. Soc. 140, 2427 (1993).CrossRefGoogle Scholar
19. Vengurlekar, A. S., Ramanathan, K. V. and Karulkar, V. T., J. Electrochem. Soc. 132, 1172 (1985).CrossRefGoogle Scholar
20. Kirchhof, J., Unger, S., Klein, K.-F. and Knappe, B., J. Non-Cryst. Solids, 181, 266 (1995).CrossRefGoogle Scholar

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