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Structural Characterization of Ru-B 4c Multilayers Fabricated By Magnetron Sputtering

Published online by Cambridge University Press:  22 February 2011

D. G. Stearns
Affiliation:
Lawrence Livermore National Laboratory, Livermore, CA
R. S. Rosen
Affiliation:
Lawrence Livermore National Laboratory, Livermore, CA
S. P. Vernon
Affiliation:
Brigham Young University, Provo, UT
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Abstract

Multilayer structures composed of alternating, ultrathin layers of Ru and B4C have been fabricated using DC magnetron sputtering. These multilayers are potentially important as normal incidence x-ray reflectors at wavelengths above the boron K-absorption edge at 65Å. The detailed structure of the layers has been characterized using x-ray diffraction and high-resolution transmission electron microscopy. It is found that, under optimized deposition conditions, continuous layers can be grown that have smooth and abrupt interfaces. The normal incidence reflectivity at x-ray wavelengths of ∼70Å has been measured, and values as high as 20% have been obtained.

Type
Research Article
Copyright
Copyright © Materials Research Society 1991

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References

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