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Soft Lithographic Printing of Titanium Dioxide and the Resulting Silica Contamination Layer

Published online by Cambridge University Press:  19 August 2014

Travis Curtis
Affiliation:
Department of Engineering, Arizona State University, Mesa, Arizona, USA.
Lakshmi V. Munukutla
Affiliation:
Department of Engineering, Arizona State University, Mesa, Arizona, USA.
Arunachalanadar M. Kannan
Affiliation:
Department of Engineering, Arizona State University, Mesa, Arizona, USA.
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Abstract

Soft lithographic printing techniques can be used to print nanoparticle dispersions with relative ease while allowing for a measureable degree of controllability of printed feature size. In this study, a Polydimethylsiloxane (PDMS) stamp was used to print multi-layered, porous, nanoparticle dispersions of titanium dioxide (TiO2), for use in a dye-sensitized solar cell application. The gelled patterns were then sintered and the surface of the printed sample was chemically analyzed.

X-ray photoelectron spectroscopy (XPS) was used to determine the surface constituents of the printed sample. The presence of a secondary peak feature located approximately 2.8 eV above the high resolution O1s core level binding energy peak was attributed to a contamination layer. Fourier transform infrared spectra (FTIR) of the printed sample revealed the presence of vibrational modes characteristic of the asymmetric bond stretching of silica, located at approximate wavenumbers of 1260 and 1030 cm-1.

Soft lithographic techniques are a viable manufacturing technique in a number of disciplines and sintered nano-oxide dispersions are readily used as reaction centers in a number of technologies. The presence of a residual, bonded silicate contamination layer may preclude the soft lithographic printing of chemically active oxide surfaces.

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Articles
Copyright
Copyright © Materials Research Society 2014 

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References

Schift, H., “Nanoimprint Lithography: An Old Story in Modern Times? A Review.” Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 26.2, 458-80 (2008).CrossRefGoogle Scholar
Guo, L.J., “Nanoimprint Lithography: Methods and Material Requirements.” Advanced Materials 19.4, 495-513 (2007).CrossRefGoogle Scholar
Qin, D., Younan, X., and Whitesides, G.M., “Soft Lithography for Micro- and Nanoscale Patterning.” Nature Protocols 5.3, 491-502 (2010).CrossRefGoogle Scholar
Xia, D., Jiang, Y.B., He, X., and Brueck, S.R.J.. “Titania Nanostructure Arrays from Lithographically Defined Templates.” Applied Physics Letters 97.22, 223106 (2010).CrossRefGoogle Scholar
Zaumseil, J. et al. ., “Three-Dimensional and Multilayer Nanostructures Formed by Nanotransfer Printing.” Nano Letters 3.9, 1223-7 (2003).CrossRefGoogle Scholar
Weiss, D. et al. ., “Nanoimprinting for Diffractive Light Trapping in Solar Cells.” Journal of Vacuum Science & Technology. B 28.6 C6M98-103 (2010).Google Scholar
Richmond, D.A., Zhang, Q., Cao, G., and Weiss, D.N.. “Pressureless Nanoimprinting of Anatase TiO2 Precursor Films.” Journal of Vacuum Science and Technology B 29.2, 022603 (2011).Google Scholar
Fang, Q. et al. ., “FTIR and XPS investigation of Er-doped SiO2-TiO films.” Materials Science and Engineering B. 105, 209–13 (2003).CrossRefGoogle Scholar
Netterfield, R.P., Martin, P.J., Pacey, C.G., and Saintly, W.G., “Ion-assisted deposition of mixed TiO2-SiO2 films.” J. Appl. Phys. 66, 1805–9 (1989).CrossRefGoogle Scholar
Sirimahachai, U., Ndiege, N., Chandrasekharan, R., Wongnawa, S., and Shannon, M.A., “Nanosized TiO2 particles decorated on SiO2 spheres (TiO2/SiO2) synthesis and photocatalytic activities.” J. Sol-Gel. Sci. Technol. 56, 5360 (2010).CrossRefGoogle Scholar
Masuda, Y., Jinbo, Y., Yonezawa, T., and Koumoto, K., “Templated Site-Selective Deposition of Titanium Dioxide on Self-Assembled Monolayers.” Chem. Mater. 14, 1236–41 (2002).CrossRefGoogle Scholar
Huang, D., Xiao, Z.D., Gu, J.H., Huang, N.P., and Yuan, C.W., “TiO2 thin films formation on industrial glass through self-assembly processing.” Thin Solid Films. 305, 110–5 (1996).CrossRefGoogle Scholar
Fulton, C.C., Lucovsky, G., and Nemanich, R.J., “Electronic states at the interface of Ti-Si oxide on Si(100).” J. Vac. Sci. Technol. B. 20,4, 1726–31 (2002).CrossRefGoogle Scholar
Lappi, S.E., Smith, B., and Franzen, S., “Infrared spectra of H2 16O,H2 18O, and D2O in the liquid phase by single-pass attenuated total internal reflection spectroscopy.” Spectrochemica Acta A. 60, 2611–9 (2004).CrossRefGoogle Scholar
Kirk, C. T., “Quantitative analysis of the effect of disorder-induced mode coupling on infrared absorption of silica.” Phys. Rev. B. 38,2, 1255–73 (1988).CrossRefGoogle ScholarPubMed
Ferguson, J. D., Smith, E.R., Weimer, A.W., and George, S.M., “ALD of SiO2 at Room Temperature using TEOS and H2O with NH3 as the Catlayst.” J. Electrochem. Soc. 151, G528–35 (2004).CrossRefGoogle Scholar
Bjorkman, C.H., Yamazaki, T., Miyazaki, S., and Hirose, M., “Analysis of infrared attenuated total reflection spectra from thin SiO2 films on Si.” J. Appl. Phys., 77.1, 313-7 (1995).CrossRefGoogle Scholar

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