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Selective Area Laser Induced Deposition of Metal Boride Thin Films

Published online by Cambridge University Press:  10 February 2011

Z.C. Zhong
Affiliation:
Center for Materials Research and Analysis and Department of Physics and Astronomy, University of Nebraska, Lincoln, NE 68588 - 0111, USA
V. Holmes
Affiliation:
Center for Materials Research and Analysis and Department of Physics and Astronomy, University of Nebraska, Lincoln, NE 68588 - 0111, USA
P.A. Dowben
Affiliation:
Center for Materials Research and Analysis and Department of Physics and Astronomy, University of Nebraska, Lincoln, NE 68588 - 0111, USA
D.J. Sellmyer
Affiliation:
Center for Materials Research and Analysis and Department of Physics and Astronomy, University of Nebraska, Lincoln, NE 68588 - 0111, USA
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Abstract

We have developed a novel technique for the selective area deposition of rare earth hexaborides: laser-induced solution deposition (LISD). This technique is both simple and efficient and combines many advantages of both chemical vapor deposition and electrolytic deposition. The results of LISD deposition show that the polycrystalline thin films of rare earth hexaborides and sub-borides such as MB6, MB4, and MB2 (M = Gd, La) are formed through the light initiated chemical reaction of nido-decaborane (B10H14) and rare earth chloride in solution. These films grow with a strong texture growth axis and morphology that is dependent both on the selection of solvents and laser wavelengths and power used in LISD.

Type
Research Article
Copyright
Copyright © Materials Research Society 2000

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