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Residual Stress Analysis of Al Alloy Thin Films by X-Ray Diffraction as a Function of Film Thickness
Published online by Cambridge University Press: 22 February 2011
Abstract
Residual stress has been measured as a function of layer thickness in thin films of an Al alloy on oxidized Si by the x-ray “d” versus sin2ψ technique. Samples with and without a passivation layer were examined. The results show an increase in residual stress with decreasing film thickness for the passivated samples and indicates that the interface between the metal film and SiO2 may be a region of high stress.
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- Copyright © Materials Research Society 1989
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