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Pulsed Laser Deposition of Laterally Graded X-Ray Optical Multilayers on Substrates of Technical Relevance

Published online by Cambridge University Press:  15 February 2011

R. Dietsch
Affiliation:
FhG-Institut für Werkstoffphysik und Schichttechnologie, Helmholtzstralße 20, D-01069 Dresden, Germany
TH. Holz
Affiliation:
FhG-Institut für Werkstoffphysik und Schichttechnologie, Helmholtzstralße 20, D-01069 Dresden, Germany
R. Krawietz
Affiliation:
TU Dresden, Institut für Kristallographie und Festkörperphysik, Mommsenstraße 13, D-01069 Dresden, Germany
H. Mai
Affiliation:
FhG-Institut für Werkstoffphysik und Schichttechnologie, Helmholtzstralße 20, D-01069 Dresden, Germany
B. SchÖneich
Affiliation:
FhG-Institut für Werkstoffphysik und Schichttechnologie, Helmholtzstralße 20, D-01069 Dresden, Germany
R. Scholz
Affiliation:
MPI für Mikrostrukturphysik, Am Weinberg 02, D-06120 Halle, Germany
S. VÖllmar
Affiliation:
FhG-Institut für Werkstoffphysik und Schichttechnologie, Helmholtzstralße 20, D-01069 Dresden, Germany
B. Wehner
Affiliation:
TU Dresden, Institut für Kristallographie und Festkörperphysik, Mommsenstraße 13, D-01069 Dresden, Germany
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Abstract

Pulsed Laser Deposition (PLD) is used for the preparation of Ni/C, W/C, and Mo/Si multilayers having X-ray optical quality. For the synthesis of layer stacks involving a uniform or a graded thickness distribution across 4"-wafers the conventional thin film deposition equipment of PLD has been modified. This modification provides a precise spatial control of the plasma plume orientation in the deposition chamber. With this arrangement the emission characteristic of the plasma source can be computer controlled and the desired coating profile can be tailored across an extended substrate via a stepper-motor-driven target manipulator.

Thus film thickness uniformity (δts < 2%) is obtained on substrates up to 4" diameter even for smaller target-substrate distances. For laterally graded Ni and C individual layers linear thickness gradients of dts/dx = 3.2 × 10−8 were confirmed over the total substrate length by spectroscopic ellipsometry. The parameters deduced from single layer deposition were applied for the synthesis of laterally graded Ni/C multilayers. A mean value of the gradient of the stack period thickness dt/dx = 6.2 × 10−8 confirmed by X-ray reflectometry (nominal value: dt0 /dx = 6.4×10−8 ) characterizes precision and reproducibility of the coating process.

Type
Research Article
Copyright
Copyright © Materials Research Society 1995

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References

REFERENCES

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